Elimination of notch during gate polycide stack etching by adding nitrogen in over etch step

2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) ◽

10.1109/ppid.2000.870594 ◽

2002 ◽

Author(s):

Bor-Wen Chan ◽

Y.H. Liou ◽

Min-Hwa Chi

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