Magnetron Sputtering Deposition of Copper on Polymers in High Density Interconnection PCB's

2006 ◽  
Author(s):  
J. Borecki ◽  
J. Felba ◽  
W. Posadowski
Keyword(s):  
Magnetron Sputtering ◽  
High Density ◽  
Sputtering Deposition

Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN

2021 ◽  
pp. 138792
Author(s):  
K. Bobzin ◽  
T. Brögelmann ◽  
N.C. Kruppe ◽  
M. Engels ◽  
C. Schulze
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Substrate Bias ◽  
Sputtering Deposition ◽  
Pulsed Magnetron

Wafer-Scale Growth of ITO Nanorods by Radio Frequency Magnetron Sputtering Deposition

2011 ◽  
Vol 158 (5) ◽  
pp. K131 ◽  
Author(s):  
Jae Hyoung Park ◽  
Hoo Keun Park ◽  
Jinhoo Jeong ◽  
Woong Kim ◽  
Byoung Koun Min ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
Scale Growth ◽  
Sputtering Deposition ◽  
Wafer Scale

Preparation of Sn doped SiO2thin films by magnetron sputtering deposition using metal and metal-oxide powder targets

2018 ◽  
Vol 58 (SA) ◽  
pp. SAAD04 ◽  
Author(s):  
Hiroharu Kawasaki ◽  
Tamiko Ohshima ◽  
Yoshihito Yagyu ◽  
Takeshi Ihara ◽  
Masanori Shinohara ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Metal Oxide ◽  
Oxide Powder ◽  
Sputtering Deposition ◽  
Metal Oxide Powder

The Structure and Electrical Property of sp2 Rich Carbon Films by Magnetron Sputtering

2014 ◽  
Vol 998-999 ◽  
pp. 120-123
Author(s):  
Jun Du ◽  
Xiao Ying Zhu ◽  
Yan Zang ◽  
Lei Guo
Keyword(s):  
Electrical Resistivity ◽  
Magnetron Sputtering ◽  
Carbon Films ◽  
Wear Volume ◽  
Chemical Bonds ◽  
Micro Hardness ◽  
X Ray Diffraction ◽  
Sputtering Deposition ◽  
X Ray ◽  
Pin On Disk

sp2 rich carbon films were produced by using magnetron sputtering deposition. The hardness, friction coefficient and wear volume were elevated by Knoop micro-hardness and pin-on-disk tester; The composition and microstructure of the carbon films have been characterized in detail by combining the techniques of Rutherford Backscattering Spectrum (RBS), X-Ray Photoelectron Spectrum (XPS) and X-Ray Diffraction (XRD); the electrical resistivity was measured by Four Probe Methods (FPM). It is found that: the films hardness are 11~17GPa (HK0.05), the friction coefficients are 0.1-0.2, the wear rate is 10-15m3/Nm; The maximum intensity position in the C1s indicates the chemical bonds are mainly sp2; the electrical resistivity is 1~2×10-4Ω·m. XRD proves these carbon films are amorphous.

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