Numerical simulation of a microwave driven low pressure plasma for pet bottle treatment

Author(s):  
D. Szeremley ◽  
R. P. Brinkmann ◽  
T. Mussenbrock ◽  
S. Steves ◽  
P. Awakowicz ◽  
...  
Author(s):  
C. George ◽  
E. Pfender ◽  
H.-D. Steffens

Abstract Maximizing dissociated species transport in plasma assisted chemical vapor deposition (CVD), is important in many low pressure plasma jet processes. To deposit high quality diamond by low pressure plasma assisted CVD, it is important to maximize the atomic hydrogen transport to the substrate. One route to process improvement is to explore ways in which unstable species transport can be maximized. A two-dimensional computational model of a supersonic contoured nozzle attached to a dc torch will be described for examining the chemical non-equilibrium of the flow. If the fluid dynamic time scales of interest are faster than the kinetic time scales of interest, it is believed that unstable precursor transport can be controlled, improved and optimized. This paper will examine an implicit formulation for the numerical simulation of a multi-component reacting Ar-H2 plasma. It is found that dissociation, ionization and charge exchange reactions must all be included in a reaction model. The ionic species significantly alter the temperature profiles upstream of nozzle choking. However, to increase the number of hydrogen atoms at the nozzle exit, the arc attachment should be positioned as close as possible to the converging-diverging nozzle throat.


2000 ◽  
Vol 10 (PR5) ◽  
pp. Pr5-243-Pr5-246
Author(s):  
A. S. Arefiev ◽  
V. A. Antoshkin ◽  
P. V. Senin ◽  
Yu. A. Yudaev

2009 ◽  
Vol 24 (1) ◽  
pp. 117-121 ◽  
Author(s):  
Chun-Ming DENG ◽  
Ke-Song ZHOU ◽  
Min LIU ◽  
Chang-Guang DENG ◽  
Jin-Bing SONG ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (17) ◽  
pp. 3852
Author(s):  
Bongjun Gu ◽  
Dongwook Ko ◽  
Sungjin Jo ◽  
Dong Choon Hyun ◽  
Hyeon-Ju Oh ◽  
...  

Wrinkles attract significant attention due to their ability to enhance the mechanical and optical characteristics of various optoelectronic devices. We report the effect of the plasma gas type, power, flow rate, and treatment time on the wrinkle features. When an optical adhesive was treated using a low-pressure plasma of oxygen, argon, and nitrogen, the oxygen and argon plasma generated wrinkles with the lowest and highest wavelengths, respectively. The increase in the power of the nitrogen and oxygen plasma increased the wavelengths and heights of the wrinkles; however, the increase in the power of the argon plasma increased the wavelengths and decreased the heights of the wrinkles. Argon molecules are heavier and smaller than nitrogen and oxygen molecules that have similar weights and sizes; moreover, the argon plasma comprises positive ions while the oxygen and nitrogen plasma comprise negative ions. This resulted in differences in the wrinkle features. It was concluded that a combination of different plasma gases could achieve exclusive control over either the wavelength or the height and allow a thorough analysis of the correlation between the wrinkle features and the characteristics of the electronic devices.


Agronomy ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 338
Author(s):  
Naeem Ahmed ◽  
Asad Masood ◽  
Kim S. Siow ◽  
M. F. Mohd Razip Wee ◽  
Rahmat Zaki Auliya ◽  
...  

In general, seed germination is improved by low-pressure plasma (LPP) treatment using precursors such as air, nitrogen, argon, or water (H2O). Here, H2O-based LPP treatment using the optimized parameters of 10 W and 10 s improves the germination of Bambara groundnut seeds by 22%. LPP increases the wettability and roughness of the seed hilum while oxidizing the surface with carboxyl and amine groups. In this H2O-based treatment of Bambara groundnut seeds, combinatory etching and chemical modification facilitated the imbibition process and increased the germination percentage. The success of this method has the potential to be scaled up to solve food security with seeds otherwise facing germination-related issues.


Author(s):  
Gabriel Morand ◽  
Pascale Chevallier ◽  
Linda Bonilla‐Gameros ◽  
Stéphane Turgeon ◽  
Maxime Cloutier ◽  
...  

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