Generation of Compressed GeV-Electron Bunch by Intense Short Pulse Laser

2005 ◽  
Author(s):  
Shuji Miyazaki ◽  
Kei Sakai ◽  
Ryo Sonobe ◽  
Shotaro Hasumi ◽  
Takashi Kikuchi ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Electron Bunch ◽  
Short Pulse ◽  
Short Pulse Laser

Micro electron bunch generation by intense short pulse laser

2003 ◽  
Vol 36 (23) ◽  
pp. 2878-2882 ◽  
Author(s):  
Shuji Miyazaki ◽  
Qing Kong ◽  
Shigeo Kawata ◽  
Jiri Limpouch
Keyword(s):  
Pulse Laser ◽  
Electron Bunch ◽  
Short Pulse ◽  
Short Pulse Laser

scholarly journals Generation of High-Density Atto-Second Electron Bunch by Intense Short Pulse Laser

2007 ◽  
Vol 127 (4) ◽  
pp. 199-204
Author(s):  
Shotaro Hasumi ◽  
Shuji Miyazaki ◽  
Shigeo Kawata ◽  
Qing Kong ◽  
Kei Sakai ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Electron Bunch ◽  
Short Pulse ◽  
High Density ◽  
Short Pulse Laser

scholarly journals Electron bunch acceleration and trapping by ponderomotive force of an intense short-pulse laser

2005 ◽  
Vol 23 (01) ◽  
Author(s):  
SHIGEO KAWATA ◽  
QING KONG ◽  
SHUJI MIYAZAKI ◽  
KOHICHI MIYAUCHI ◽  
RYO SONOBE ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Electron Bunch ◽  
Ponderomotive Force ◽  
Short Pulse ◽  
Short Pulse Laser

Electron bunch acceleration and trapping by the ponderomotive force of an intense short-pulse laser

2003 ◽  
Vol 10 (12) ◽  
pp. 4605-4608 ◽  
Author(s):  
Q. Kong ◽  
S. Miyazaki ◽  
S. Kawata ◽  
K. Miyauchi ◽  
K. Nakajima ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Electron Bunch ◽  
Ponderomotive Force ◽  
Short Pulse ◽  
Short Pulse Laser

Silicon Thinning using Ultra-Short Pulse Laser Ablation

2004 ◽  
Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Sample Preparation ◽  
Pulse Laser ◽  
Pulse Laser Ablation ◽  
Short Pulse ◽  
Special Care ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.

Chromium oxide dissolution in steels via short pulse laser processing

2013 ◽  
Vol 115 (4) ◽  
pp. 1469-1477 ◽  
Author(s):  
Evgeny Kharanzhevskiy ◽  
Sergey Reshetnikov
Keyword(s):  
Pulse Laser ◽  
Chromium Oxide ◽  
Laser Processing ◽  
Short Pulse ◽  
Oxide Dissolution ◽  
Short Pulse Laser
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