In-Situ Electron Cyclotron Resonance (ECR) Plasma Potential Determination Using an Emissive Probe

2006 ◽  
Author(s):  
H.J. You ◽  
Y. Liu ◽  
F.W. Meyer
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Plasma Potential ◽  
Electron Cyclotron ◽  
Ecr Plasma ◽  
Emissive Probe

Stability and spatial characterization of electron cyclotron resonance processing plasmas

1991 ◽  
Vol 69 (3-4) ◽  
pp. 195-201 ◽  
Author(s):  
P. K. Shufflebotham ◽  
D. J. Thomson
Keyword(s):  
Electron Temperature ◽  
Plasma Density ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Plasma Potential ◽  
Electron Cyclotron ◽  
Temperature Plasma ◽  
Ecr Plasma ◽  
The Stability ◽  
System Variables

This paper presents preliminary measurements of the spatial variation of the plasma density, electron temperature, plasma potential, and floating voltage within a divergent magnetic field electron cyclotron resonance (ECR) plasma processing reactor. The measurements are performed using an orbital-motion-limited cylindrical Langmuir probe designed specifically for use in these plasmas. A brief discussion of the stability and uniformity of divergent field plasmas in general, and qualitative techniques for the diagnosis of these properties, is also given. It was found that these plasmas generally occurred in distinct "modes," characterized by unique shapes and dependences on system variables, and between which discontinuous, noisy, and often bistable transitions occurred. Axially resolved probe measurements performed under ECR conditions showed that the plasma density exhibited a broadly peaked profile, while the electron temperature showed a sharp peak at ECR. The differences in these profiles leads to three qualitatively different plasma regions available for use in ECR processing. The variation of the plasma potential explains the origin of the axial ion beams that commonly occur in these systems.

Magnetic Confinement of Plasmas Generated by Coaxial Twinned Electron Cyclotron Resonance (ECR) Discharge

2011 ◽  
Vol 413 ◽  
pp. 18-23
Author(s):  
Geng Shun Chen ◽  
Rui Hong Tong ◽  
An Hua Zhang
Keyword(s):  
Magnetic Field ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Radial Distance ◽  
Diagnostic Technique ◽  
Magnetic Confinement ◽  
Plasma Potential ◽  
Electron Cyclotron ◽  
Ecr Plasma ◽  
The Magnetic Field

Effects of the magnetic field on confinement of the coaxial twined ECR plasmas were studied using the Lanmuir probe diagnostic technique. Under the magnetic-mirror confinement, the plasma density was quite high in the vicinity of the axis of the ECR sources but it decreased rapidly with increasing radial distance; while under the cusped field confinement, the density was lower but uniform. The trend was similar for the electron temperature and the plasma potential. This property may be utilized in materials processes to meet different requirements. Key words: Electron cyclotron resonance (ECR), Plasma, Magnetic confinement, The cusped field confinement.PACS: 52.80.Pi, 52.55.-s, 52.70.-m

Basic experiments on in-situ magnetized boronization by electron cyclotron resonance discharges

1997 ◽  
Vol 241-243 ◽  
pp. 1217-1221 ◽  
Author(s):  
H. Kokura ◽  
K. Sasaki ◽  
H. Toyoda ◽  
T. Mizuuchi ◽  
K. Kondo ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Basic Experiments

Hydrogen in Dielectric Film Formation From an Electron Cyclotron Resonance Plasma

1991 ◽  
Vol 235 ◽  
Author(s):  
J. C. Barbour ◽  
H. J. Stein
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Ion Irradiation ◽  
Film Formation ◽  
Ion Beam ◽  
Electron Cyclotron ◽  
Elastic Recoil ◽  
Elastic Recoil Detection ◽  
Ecr Plasma ◽  
The Stability

ABSTRACTThe incorporation of hydrogen into silicon nitride films grown downstream from an electron cyclotron resonance (ECR) plasma decreased rapidly with increasing substrate temperature (100–600°C). Fourier transform infra-red (FTIR) spectroscopy showed that the hydrogen in the as-grown material was primarily bonded to nitrogen. However, an applied bias of -200 V caused an increase in the number of Si-H bonds relative to N-H bonds, as a result of increased ion-beam damage. In addition, ion irradiation of an as-grown film with 175 keV Ar+ at room temperature showed that H transferred from N-H bonds to Si-H bonds without a loss of H. Elastic recoil detection (ERD) and FTIR of thermally annealed films showed that the stability of H incorporated during deposition increased with deposition temperature, and that the N-H bond was more stable than the Si-H bond above 700°C. Deuterium plasma treatments, at 600°C, of annealed films caused isotopic substitution with a conservation of bonds. Therefore, hydrogen loss from annealed films is apparently accompanied by a reduction in dangling bonds.

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