HgTe Nanocrystal-Based Thin-Film Transistors Fabricated on Glass Substrates

2007 ◽  
Vol 28 (1) ◽  
pp. 42-44 ◽  
Author(s):  
Hyunsuk Kim ◽  
Dong-Won Kim ◽  
Kyoungah Cho ◽  
Sangsig Kim
2018 ◽  
Vol 5 (2) ◽  
pp. 16-18
Author(s):  
Chandar Shekar B ◽  
Ranjit Kumar R ◽  
Dinesh K.P.B ◽  
Sulana Sundar C ◽  
Sunnitha S ◽  
...  

Thin films of poly vinyl alcohol (PVA) were prepared on pre-cleaned glass substrates by Dip Coating Method. FTIR spectrum was used to identify the functional groups present in the prepared films. The vibrational peaks observed at 1260 cm-1 and 851 cm-1 are assigned to C–C stretching and CH rocking of PVA.The characteristic band appearing at 1432 cm-1 is assigned to C–H bend of CH2 of PVA. The thickness of the prepared thin films were measured by using an electronic thickness measuring instrument (Tesatronic-TTD20) and cross checked by gravimetric method. XRD spectra indicated the amorphous nature of the films.Surface morphology of the coated films was studied by scanning electron microscope (SEM). The surface revealed no pits and pin holes on the surface. The observed surface morphology indicated that these films could be used as dielectric layer in organic thin film transistors and as drug delivery system for wound healing.


2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Kyohei Nakamura ◽  
Atsushi Kobayashi ◽  
Kohei Ueno ◽  
Jitsuo Ohta ◽  
Hiroshi Fujioka

1989 ◽  
Vol 32 (5) ◽  
pp. 391-396 ◽  
Author(s):  
W. Schmolla ◽  
J. Diefenbach ◽  
G. Blang ◽  
B. Ocker ◽  
W. Senske

1998 ◽  
Vol 319 (1-2) ◽  
pp. 106-109 ◽  
Author(s):  
Katsuhiro Tsujimoto ◽  
Satoshi Tsuji ◽  
Kotaro Kuroda ◽  
Hiroyasu Saka

2004 ◽  
Vol 808 ◽  
Author(s):  
I-Chun Cheng ◽  
Sigurd Wagner

ABSTRACTInverters made of monolithically integrated p- and n-channel thin film transistors of nanocrystalline silicon were demonstrated on both Corning 1737 glass and Kapton E polyimide substrates. The TFT's geometry is staggered top-gate, bottom-source/rain. A nc-Si:H seed layer promotes the structural evolution of the nc-Si:H channel. Electron field-effect mobilities of 15 - 30 cm2V−1s-1 and hole mobilities of 0.15 - 0.35 cm2V−1s−1 were obtained. Slightly lower carrier mobilities were observed in the TFTs made on polyimide than on glass substrates. High gate leakage currents and offsets between the supply HIGH voltages and the output voltages in the inverters indicate that the low-temperature gate dielectric needs improvement.


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