Further EOT scaling of Ge/HfO2 over Si/HfO2 MOS systems

Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765) ◽

10.1109/iwgi.2003.159209 ◽

2003 ◽

Cited By ~ 1

Author(s):

K. Kita ◽

M. Sasagawa ◽

K. Tomida ◽

M. Tohyama ◽

K. Kyuno ◽

...

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