Vapor-liquid hybrid deposition (VALID) of hafnium silicate films using Hf(O/sup t/C4H/sub 9/)4 and Si(OC2H5)4 precursors
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1953 ◽
Keyword(s):
2020 ◽
Vol 94
(9)
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pp. 1761-1770
1956 ◽
Vol 21
(2)
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pp. 269-280
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1954 ◽
Vol 46
(2)
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pp. 334-338
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1999 ◽
Vol 155
(2)
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pp. 287-296
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