Metalorganic chemical vapor deposited thin films of high-k La-oxides

2002 ◽  
Author(s):  
T. Shimizu ◽  
H. Yamada ◽  
A. Kurokawa ◽  
K. Ishi ◽  
E. Suzuki
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
High K ◽  
Chemical Vapor Deposited ◽  
Metalorganic Chemical

High-resolution electron microscopy investigations of stacking faults in Y1Ba2Cu3O7−δ metalorganic chemical vapor deposited thin films

1999 ◽  
Vol 14 (7) ◽  
pp. 2732-2738 ◽  
Author(s):  
Ch. Grigis ◽  
S. Schamm ◽  
D. Dorignac
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
High Resolution ◽  
Image Matching ◽  
Chemical Vapor ◽  
High Resolution Electron Microscopy ◽  
Resolution Electron ◽  
Chemical Vapor Deposited ◽  
Structural Imperfections ◽  
Metalorganic Chemical

New structural planar defects in Ba-deficient Y1Ba2Cu3O7−δ (YBCO) (1:1.6:3) thin films grown on NdGaO3 and SrTiO3 substrates by metalorganic chemical vapor deposition have been observed by means of high-resolution electron microscopy. The defects are associated with perturbations of the YBCO “1:2:3” stacking sequences along the c direction, which give rise to structural variants with locally “2:5:7,” “3:4:7,” or “4:6:10” cationic stoichiometries. The defects can be consistently interpreted as CuO–YO–CuO/CuO conversions or YO/BaO (BaO/YO) interconversions in the (a,b) planes and extending over a few nanometers along the c axis. Structural models based on image matching with simulations are proposed for two particular cases. It is thought that these structural imperfections can be effective sites of flux pinning.

Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films

2007 ◽  
Vol 42 (8) ◽  
pp. 2758-2765 ◽  
Author(s):  
M. A. Eleruja ◽  
G. O. Egharevba ◽  
O. A. Abulude ◽  
O. O. Akinwunmi ◽  
C. Jeynes ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapor ◽  
Oxide Thin Films ◽  
Lithium Nickel Oxide ◽  
Chemical Vapor Deposited ◽  
Metalorganic Chemical ◽  
Nickel Oxide Thin Films

Microstrip resonators using two‐sided metalorganic chemical vapor deposited Er‐Ba‐Cu‐O thin films

1991 ◽  
Vol 58 (10) ◽  
pp. 1109-1111 ◽  
Author(s):  
J. H. Takemoto ◽  
C. M. Jackson ◽  
H. M. Manasevit ◽  
D. C. St. John ◽  
J. F. Burch ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited ◽  
Microstrip Resonators ◽  
Metalorganic Chemical
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