A transmission electron energy loss spectrometry study for the source of an anomalous positive exchange bias in a Ni80Fe20/NixFe1-xO thin-film bilayer

2006 ◽  
Author(s):  
H. Ouyang ◽  
K. Lin ◽  
C. Liu ◽  
Y. Tzeng ◽  
Z. Guo ◽  
...  
Keyword(s):  
Thin Film ◽  
Energy Loss ◽  
Electron Energy ◽  
Exchange Bias ◽  
Transmission Electron ◽  
Electron Energy Loss Spectrometry ◽  
Electron Energy Loss

Accurate quantification of lithium in aluminium-lithium alloys with electron energy-loss spectrometry

1989 ◽  
Vol 425 (1868) ◽  
pp. 91-111 ◽  
Keyword(s):  
Energy Loss ◽  
Electron Energy ◽  
Partial Cross Section ◽  
Specimen Preparation ◽  
Transmission Electron ◽  
Electron Energy Loss Spectrometry ◽  
Δ Phase ◽  
Extrapolation Scheme ◽  
Electron Energy Loss ◽  
Accurate Quantification

The composition of the Al 3 Li (δ)' metastable precipitation-hardening phase is an important factor in understanding the strengthening behaviour of Al-Li base alloys. The procedure for using electron energy-loss spectrometry in a transmission electron microscope for accurate quantification of the Li content of δ' is established. All factors that can affect the accuracy of the analysis procedure are considered, namely: the specimen preparation, the mode of operation of the microscope, the identification of spectra from through-thickness regions of the specimen, the calibration of the Li / Al partial cross-section ratio, the deconvolution of the spectra and the background extrapolation scheme. The composition of the δ' phase in the temperature range 155-290 °C is determined, and the non-stoichiometry of this phase is clearly shown.

Investigation of Switching Mechanism in HfO2-Based Oxide Resistive Memories by In-Situ Transmission Electron Microscopy and Electron Energy Loss Spectroscopy

2017 ◽  
Author(s):  
T. Dewolf ◽  
D. Cooper ◽  
N. Bernier ◽  
V. Delaye ◽  
A. Grenier ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Energy Loss ◽  
Electron Energy ◽  
Electron Energy Loss Spectroscopy ◽  
Hafnium Dioxide ◽  
Switching Mechanism ◽  
Transmission Electron ◽  
Electron Energy Loss

Abstract Forming and breaking a nanometer-sized conductive area are commonly accepted as the physical phenomenon involved in the switching mechanism of oxide resistive random access memories (OxRRAM). This study investigates a state-of-the-art OxRRAM device by in-situ transmission electron microscopy (TEM). Combining high spatial resolution obtained with a very small probe scanned over the area of interest of the sample and chemical analyses with electron energy loss spectroscopy, the local chemical state of the device can be compared before and after applying an electrical bias. This in-situ approach allows simultaneous TEM observation and memory cell operation. After the in-situ forming, a filamentary migration of titanium within the dielectric hafnium dioxide layer has been evidenced. This migration may be at the origin of the conductive path responsible for the low and high resistive states of the memory.

In Situ Analysis of Surface Contaminant Desorption during Low-Temperature Silicon Substrate Cleaning using Reflection Electron Energy Loss Spectrometry

1992 ◽  
Vol 259 ◽  
Author(s):  
Selmer S. Wong ◽  
Shouleh Nikzad ◽  
Channing C. Ahn ◽  
Aimee L. Smith ◽  
Harry A. Atwater
Keyword(s):  
Low Temperature ◽  
Energy Loss ◽  
Electron Energy ◽  
Core Loss ◽  
Temperature Dependent ◽  
Electron Energy Loss Spectrometry ◽  
Analysis Technique ◽  
Chemical Analysis Technique ◽  
Electron Energy Loss

ABSTRACTWe have employed reflection electron energy loss spectrometry (REELS), a surface chemical analysis technique, in order to analyze contaminant coverages at the submonolayer level during low-temperature in situ cleaning of hydrogen-terminated Si(100). The chemical composition of the surface was analyzed by measurements of the C K, O K and Si L2,3 core loss intensities at various stages of the cleaning. These results were quantified using SiC(100) and SiO2 as reference standards for C and O coverage. Room temperature REELS core loss intensity analysis after sample insertion reveals carbon at fractional monolayer coverage. We have established the REELS detection limit for carbon coverage to be 5±2% of a monolayer. A study of temperature-dependent hydrocarbon desorption from hydrogen-terminated Si(100) reveals the absence of carbon on the surface at temperatures greater than 200°C. This indicates the feasibility of epitaxial growth following an in situ low-temperature cleaning and also indicates the power of REELS as an in situ technique for assessment of surface cleanliness.

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