Synchrotron radiation stimulated etching SiO/sub 2/ thin films with a Co contact mask for the area-selective deposition of self-assembled monolayer
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2003 ◽
Vol 42
(Part 1, No. 6B)
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pp. 4016-4019
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2007 ◽
Vol 25
(1)
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pp. 114-119
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2012 ◽
Vol 185
(3-4)
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pp. 85-89
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2007 ◽
Vol 84
(5-8)
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pp. 1552-1555
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