Synchrotron radiation stimulated etching SiO/sub 2/ thin films with a Co contact mask for the area-selective deposition of self-assembled monolayer

Author(s):  
Changshun Wang ◽  
M. Rahman ◽  
T. Urisu
2009 ◽  
Vol 9 (1) ◽  
pp. 555-561 ◽  
Author(s):  
Yoshitake Masuda ◽  
Masashi Kondo ◽  
Kunihito Koumoto

1999 ◽  
Vol 561 ◽  
Author(s):  
Y. Liu ◽  
R.O. Claus ◽  
D. Marciu ◽  
C. Figura ◽  
J.R. Heflin

ABSTRACTA new method for the build-up of non-centrosymmetric multilayer thin films has been developed for the first time using an electric field-assisted electrostatic self-assembled monolayer (EF-ESAM) technique. An increase by 116% of the second-harmonic intensity of the films has been observed in comparison with that of ESAM film.


2002 ◽  
Vol 106 (24) ◽  
pp. 6265-6272 ◽  
Author(s):  
Jessica Torres ◽  
Christopher C. Perry ◽  
Stephen J. Bransfield ◽  
D. Howard Fairbrother

2012 ◽  
Vol 185 (3-4) ◽  
pp. 85-89 ◽  
Author(s):  
Erik Darlatt ◽  
Christoph H.-H. Traulsen ◽  
Johannes Poppenberg ◽  
Sebastian Richter ◽  
Julius Kühn ◽  
...  

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