Radical Reactions with Organic Thin Films:  Chemical Interaction of Atomic Oxygen with an X-ray Modified Self-Assembled Monolayer

2002 ◽  
Vol 106 (24) ◽  
pp. 6265-6272 ◽  
Author(s):  
Jessica Torres ◽  
Christopher C. Perry ◽  
Stephen J. Bransfield ◽  
D. Howard Fairbrother
Author(s):  
J Li ◽  
X H Sheng

Thin films deposited on a phosphonate 3-aminopropyltriethoxysilane (APTES) self- assembled monolayer (SAM) were prepared on a hydroxylated silicon substrate by self-assembling. The chemical compositions and the chemical state of the film elements were determined by X-ray photoelectron spectrometry. The thickness of the films was determined with an ellipsometer, while the morphologies and nanotribological properties of the samples were analysed by atomic force microscopy. As a result, the target film was obtained. It was also found that the thin films showed the lowest friction and adhesion, followed by APTES—SAM and phosphorylated APTES—SAM, while the silicon substrate showed the highest friction and adhesion. Microscale scratch/wear studies clearly showed that thin films were much more scratch/wear resistant than the other samples.


2003 ◽  
Vol 93 (8) ◽  
pp. 4852-4855 ◽  
Author(s):  
Xiangdong Liu ◽  
S. H. Mohamed ◽  
J. M. Ngaruiya ◽  
Matthias Wuttig ◽  
Thomas Michely

2018 ◽  
Vol 51 (4) ◽  
pp. 408-412
Author(s):  
Chandrashekhar Channapura Halappa ◽  
So-Jin Park

2018 ◽  
Vol 29 (21) ◽  
pp. 1806119 ◽  
Author(s):  
Andrea Ciavatti ◽  
Laura Basiricò ◽  
Ilaria Fratelli ◽  
Stefano Lai ◽  
Piero Cosseddu ◽  
...  

Hyomen Kagaku ◽  
1998 ◽  
Vol 19 (4) ◽  
pp. 259-264
Author(s):  
Kenji ISHIDA ◽  
Toshihisa HORIUCHI ◽  
Kazumi MATSUSHIGE MATSUSHIGE

2013 ◽  
Vol 35 (12) ◽  
pp. 2440-2443 ◽  
Author(s):  
Y.A. Paredes ◽  
E.G. Gravina ◽  
M.D. Barbosa ◽  
R. Machado ◽  
W.G. Quirino ◽  
...  

2010 ◽  
Author(s):  
Kazuhiko Mase ◽  
Akio Toyoshima ◽  
Takashi Kikuchi ◽  
Hirokazu Tanaka ◽  
Kenta Amemiya ◽  
...  

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