CD controllability of chemically amplified resists for x-ray membrane mask fabrication

2002 ◽  
Author(s):  
M. Ezaki ◽  
Y. Kikuchi ◽  
S. Tsuboi ◽  
H. Watanabe ◽  
H. Aoyama ◽  
...  
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Mask Fabrication

Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication

2000 ◽  
Vol 39 (Part 1, No. 12B) ◽  
pp. 6908-6913 ◽  
Author(s):  
Mizunori Ezaki ◽  
Yoshinori Nakayama ◽  
Yukiko Kikuchi ◽  
Shinji Tsuboi ◽  
Hiroshi Watanabe ◽  
...  
Keyword(s):  
Critical Dimension ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Mask Fabrication

Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4301-4306 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

Study of Radiation-Induced Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1992 ◽  
Vol 31 (Part 2, No. 11A) ◽  
pp. L1574-L1576 ◽  
Author(s):  
Takahiro Kozawa ◽  
Yoichi Yoshida ◽  
Mitsuru Uesaka ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Chemically Amplified ◽  
Radiation Induced ◽  
Chemically Amplified Resists

UVN2-negative chemically amplified resist optimization for x-ray mask fabrication

1999 ◽  
Author(s):  
Janet M. Rocque ◽  
Michael J. Lercel ◽  
Cameron J. Brooks ◽  
Richard W. Henry ◽  
Douglas E. Benoit
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

Chemically amplified resists for x-ray and e-beam lithography

1991 ◽  
Author(s):  
Amanda K. Berry ◽  
Karen A. Graziano ◽  
Stephen D. Thompson ◽  
James W. Taylor ◽  
Doowon Suh ◽  
...  
Keyword(s):  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Effects of Impurities on Processes of Acid Generation in Chemically Amplified Resists for Electron Beam and X-Ray Lithography

1993 ◽  
Vol 32 (Part 1, No. 12B) ◽  
pp. 6049-6051 ◽  
Author(s):  
Takahiro Kozawa ◽  
Mitsuru Uesaka ◽  
Yoichi Yoshida ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists

2008 ◽  
Vol 1 ◽  
pp. 065004 ◽  
Author(s):  
Takehiro Fukuyama ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryoichi Takasu ◽  
Hiroto Yukawa ◽  
...  
Keyword(s):  
Depth Profile ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resists
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