Protection and Commissioning of Multifunction Digital Transformer Relays at Medium Voltage Industrial Facilities

2006 ◽  
Author(s):  
C.J. Mozina
Keyword(s):  
Industrial Facilities ◽  
Medium Voltage

Prospects for convergent beam electron diffraction with a 200kV cold field-emission transmission electron microscope

1991 ◽  
Vol 49 ◽  
pp. 466-467
Author(s):  
J W Steeds ◽  
R Vincent
Keyword(s):  
Field Emission ◽  
High Performance ◽  
Small Diameter ◽  
Convergent Beam Electron Diffraction ◽  
Zone Axis ◽  
Medium Voltage ◽  
Transmission Electron ◽  
Good Crystallinity ◽  
Special Modification ◽  
Convergent Beam

We review the analytical powers which will become more widely available as medium voltage (200-300kV) TEMs with facilities for CBED on a nanometre scale come onto the market. Of course, high performance cold field emission STEMs have now been in operation for about twenty years, but it is only in relatively few laboratories that special modification has permitted the performance of CBED experiments. Most notable amongst these pioneering projects is the work in Arizona by Cowley and Spence and, more recently, that in Cambridge by Rodenburg and McMullan.There are a large number of potential advantages of a high intensity, small diameter, focussed probe. We discuss first the advantages for probes larger than the projected unit cell of the crystal under investigation. In this situation we are able to perform CBED on local regions of good crystallinity. Zone axis patterns often contain information which is very sensitive to thickness changes as small as 5nm. In conventional CBED, with a lOnm source, it is very likely that the information will be degraded by thickness averaging within the illuminated area.

Atomic structure imaging of the Si/SiO2 interface with high-resolution electron microscopy

1986 ◽  
Vol 44 ◽  
pp. 390-391
Author(s):  
J.L. Batstone ◽  
J.M. Gibson ◽  
Alice.E. White ◽  
K.T. Short
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Atomic Structure ◽  
High Resolution Electron Microscopy ◽  
Medium Voltage ◽  
Voltage Electron ◽  
Resolution Electron ◽  
Structural Image ◽  
Electron Microscopes ◽  
Point To Point

High resolution electron microscopy (HREM) is a powerful tool for the determination of interface atomic structure. With the previous generation of HREM's of point-to-point resolution (rpp) >2.5Å, imaging of semiconductors in only <110> directions was possible. Useful imaging of other important zone axes became available with the advent of high voltage, high resolution microscopes with rpp <1.8Å, leading to a study of the NiSi2 interface. More recently, it was shown that images in <100>, <111> and <112> directions are easily obtainable from Si in the new medium voltage electron microscopes. We report here the examination of the important Si/Si02 interface with the use of a JEOL 4000EX HREM with rpp <1.8Å, in a <100> orientation. This represents a true structural image of this interface.

Lighting of Engineering Structures and Industrial Facilities New Aspects of the Topic

2018 ◽  
pp. 29-36
Author(s):  
Nikolai I. Shepetkov ◽  
George N. Cherkasov ◽  
Vladimir A. Novikov
Keyword(s):  
Fundamental Problem ◽  
Lighting Design ◽  
Aesthetic Value ◽  
Engineering Structures ◽  
Industrial Facilities ◽  
Artificial Lighting ◽  
Industrial Structures ◽  
Design Solutions ◽  
Architectural Lighting ◽  
The Aesthetic

This paper considers the fundamental problem of artificial lighting in various types and scales of industrial facilities, focusing on exterior lighting design solutions. There is a lack of interest from investors, customers and society in high­quality lighting design for industrial facilities in Russia, which in many cities are very imaginative structures, practically unused in the evening. Architectural lighting of various types of installations is illustrated with photographs. The purpose of the article is to draw attention to the aesthetic value of industrial structures, provided not only by the architectural, but also by a welldesigned lighting solution.

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