Ultra-low-loss silicon based spot-size converter fabricated by CMOS compatible process

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Ryohei Takei ◽  
Masao Suzuki ◽  
Emiko Omoda ◽  
Shoko Manako ◽  
Toshihiro Kamei ◽  
...  
2012 ◽  
Vol E95.C (7) ◽  
pp. 1272-1275
Author(s):  
Takanori SUZUKI ◽  
Hideo ARIMOTO ◽  
Takeshi KITATANI ◽  
Aki TAKEI ◽  
Takafumi TANIGUCHI ◽  
...  

2011 ◽  
Author(s):  
Zhiyong Li ◽  
Liang Zhou ◽  
Yingtao Hu ◽  
Xi Xiao ◽  
Yude Yu ◽  
...  

2014 ◽  
Vol 39 (15) ◽  
pp. 4356 ◽  
Author(s):  
Lucas Lafone ◽  
Themistoklis P. H Sidiropoulos ◽  
Rupert F. Oulton

2019 ◽  
Vol 52 (21) ◽  
pp. 214001 ◽  
Author(s):  
P K J Singaravelu ◽  
G C R Devarapu ◽  
Sebastian A Schulz ◽  
Quentin Wilmart ◽  
Stéphane Malhouitre ◽  
...  

1997 ◽  
Vol 486 ◽  
Author(s):  
G. Cocorullo ◽  
F. G. Della Corte ◽  
R. De Rosa ◽  
I. Rendina ◽  
A. Rubino ◽  
...  

AbstractThis paper reports about the fabrication and experimental test of an interferometric light intensity modulator integrated in a low loss (0.7 dB/cm), amorphous silicon based waveguide. It measures approximately 1 mm in length, while its cross section is 30-μm-wide and 3-μm-high. The device, which exploits the strong thermo-optic effect in thin film a-Si for its operation, is designed for application at the infrared wavelengths of 1.3 and 1.55 μm. The measured maximum operating on-off switching frequency of the device is 600 kHz. The very simple fabrication technology involves maximum process temperatures of 230 °C, and is therefore compatible with the standard microelectronic technology. This offers a new opportunity for the integration of optical and electronic functions on the same substrate.


2016 ◽  
Vol 8 (5) ◽  
pp. 1-11 ◽  
Author(s):  
Luis Hoffman ◽  
Ananth Subramanian ◽  
Philippe Helin ◽  
Bert Du Bois ◽  
Roel Baets ◽  
...  

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