Two-dimensional photonic crystals fabrication and close-packing by electron-beam lithography

2012 ◽  
Author(s):  
Dmitry E. Utkin ◽  
Dmitry A. Nasimov ◽  
Alexander V. Latyshev
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Close Packing ◽  
Two Dimensional

Formation Of Two-Dimensional Photonic Crystals With Cavities Arrays In Silicon

2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Interference Effects ◽  
Technological Parameters ◽  
Beam Interaction ◽  
Cavity Array ◽  
Better Than

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

Fast nanopatterning of two-dimensional photonic crystals by electron beam lithography

2004 ◽  
Vol 36 (1-3) ◽  
pp. 265-270 ◽  
Author(s):  
T. Stomeo ◽  
A. Passaseo ◽  
R. Cingolani ◽  
M. De Vittorio
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Two Dimensional

Fabrication of two-dimensional hybrid photonic crystals utilizing electron beam lithography

2005 ◽  
Vol 78-79 ◽  
pp. 442-447 ◽  
Author(s):  
J. Stodolka ◽  
D. Nau ◽  
M. Frommberger ◽  
C. Zanke ◽  
H. Giessen ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Two Dimensional

An Instructional Two-Dimensional Diffraction Laboratory Using Patterns Created with Electron-Beam Lithography

2002 ◽  
Vol 760 ◽  
Author(s):  
Colin Inglefield ◽  
Royce Anthon
Keyword(s):  
Electron Beam ◽  
Undergraduate Students ◽  
Electron Beam Lithography ◽  
Materials Science ◽  
Reciprocal Lattice ◽  
Real Space ◽  
Two Dimensional ◽  
Solid State Physics ◽  
Modern Physics ◽  
Order Of Magnitude

ABSTRACTAn instructional laboratory in two-dimensional diffraction is discussed. The experiment is appropriate for undergraduate students in materials science, solid-state physics (as was the case with our group), modern physics, or optics. The experiment is performed using visible light from a laser incident on a 2D lattice of gold dots deposited with electron beam lithography on a glass substrate. The pattern is microscopic with a lattice constant on the same order of magnitude as the wavelength of light used. Students observe the diffraction pattern, and then quantitatively determine the positions of maxima. These data are used by the students to reconstruct the (real space) microscopic lattice. The students can simulate the experiment with software that computes reciprocal lattice and diffraction patterns for an arbitrary 2D lattice.

scholarly journals Two-dimensional structures of ferroelectric domain inversion in LiNbO3 by direct electron beam lithography

2003 ◽  
Vol 93 (12) ◽  
pp. 9943-9946 ◽  
Author(s):  
J. He ◽  
S. H. Tang ◽  
Y. Q. Qin ◽  
P. Dong ◽  
H. Z. Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Ferroelectric Domain ◽  
Two Dimensional ◽  
Domain Inversion

Plasmonic and Diffractive Coupling in 2D Arrays of Nanoparticles produced by Electron Beam Lithography

2006 ◽  
Vol 951 ◽  
Author(s):  
Erin McLellan ◽  
Linda Gunnarsson ◽  
Tomas Rindzevicius ◽  
Mikael Kall ◽  
Shengli Zou ◽  
...  
Keyword(s):  
Electron Beam ◽  
Plasmon Resonance ◽  
Electron Beam Lithography ◽  
Driving Forces ◽  
Dark Field ◽  
Interparticle Spacing ◽  
Circular Cylinders ◽  
Two Dimensional ◽  
Precise Control ◽  
Wide Range

ABSTRACTNanofabrication is one of the driving forces leading to developments in a variety of fields including microelectronics, medicine, and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Both direct write methods and natural lithography's offer a unique opportunity to fabricate “user-defined” writing of nanostructures in a wide range of materials. Electron Beam Lithography (EBL) and Nanosphere Lithography (NSL) provide the opportunity to fabricate precise nanostructures on a wide variety of substrates with a large range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one and two dimensional array structures that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. For the two dimensional arrays, to have the best control over array fabrication and to look at these interactions experimentally, EBL was used to construct both hexagonal arrays of circular cylinders and the Kagome lattice. The interparticle spacing in each of these structures was varied systematically. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, both dark-field and extinction spectroscopies were used to look at the bulk spectral properties of each array type and each spacing. In investigating of the two dimensional arrays, the Kagome structure was also compared to samples produced by traditional NSL to study the optical interaction of defects, domains, and overall sample uniformity on the shape and location of the plasmon resonance. This work illustrates a deeper understanding in the nature of the optical coupling in nanostructures and this knowledge can be utilized in the future to fabricate designer (tailor made) substrates for plasmonic and surface-enhanced raman applications.

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