scholarly journals Analysis and comparative evaluation of stacked-transistor half-bridge topologies implemented with 14 nm bulk CMOS technology

2017 ◽  
Author(s):  
P. A. M. Bezerra ◽  
R. K. Aljameh ◽  
F. Krismer ◽  
J. W. Kolar ◽  
A. Sridhar ◽  
...  
Keyword(s):  
Comparative Evaluation ◽  
Cmos Technology ◽  
Bridge Topologies

Comparison of In-the-Ear and Over-the-Ear Hearing Aid Fittings

1986 ◽  
Vol 51 (4) ◽  
pp. 362-369 ◽  
Author(s):  
Donna M. Risberg ◽  
Robyn M. Cox
Keyword(s):  
Hearing Aids ◽  
High Frequency ◽  
Comparative Evaluation ◽  
Speech Intelligibility ◽  
Hearing Aid ◽  
Hearing Aid Fitting ◽  
The Difference ◽  
Functional Gain ◽  
The Relationship

A custom in-the-ear (ITE) hearing aid fitting was compared to two over-the-ear (OTE) hearing aid fittings for each of 9 subjects with mild to moderately severe hearing losses. Speech intelligibility via the three instruments was compared using the Speech Intelligibility Rating (SIR) test. The relationship between functional gain and coupler gain was compared for the ITE and the higher rated OTE instruments. The difference in input received at the microphone locations of the two types of hearing aids was measured for 10 different subjects and compared to the functional gain data. It was concluded that (a) for persons with mild to moderately severe hearing losses, appropriately adjusted custom ITE fittings typically yield speech intelligibility that is equal to the better OTE fitting identified in a comparative evaluation; and (b) gain prescriptions for ITE hearing aids should be adjusted to account for the high-frequency emphasis associated with in-the-concha microphone placement.

CMOS TECHNOLOGY FOR CCD VIDEO MEMORIES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-41-C4-44
Author(s):  
G. J.T. DAVIDS ◽  
P. B. HARTOG ◽  
J. W. SLOTBOOM ◽  
G. STREUTKER ◽  
A. G. van der SIJDE ◽  
...  
Keyword(s):  
Cmos Technology

CMOS-TECHNOLOGY - STATUS, TRENDS AND APPLICATIONS

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-13-C4-22
Author(s):  
F. NEPPL ◽  
H.-J. PFLEIDERER
Keyword(s):  
Cmos Technology

CMOS TECHNOLOGY USING PLASMA NITRIDED OXIDE AS A GATE DIELECTRIC

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-421-C4-424 ◽  
Author(s):  
A. STRABONI ◽  
M. BERENGUER ◽  
B. VUILLERMOZ ◽  
P. DEBENEST ◽  
A. VERNA ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Cmos Technology
Sign in / Sign up

Export Citation Format

Share Document