A Hardware-Oriented High Precision Motion Vector Prediction Scheme for MPEG-2 to H.264 Transcoding

2008 ◽  
Author(s):  
Xianghui Wei ◽  
Wenming Tang ◽  
Guifen Tian ◽  
Takeshi Ikenaga ◽  
Satoshi Goto
Keyword(s):  
High Precision ◽  
Motion Vector ◽  
Prediction Scheme ◽  
Motion Vector Prediction ◽  
Precision Motion

scholarly journals Efficient motion vector prediction scheme for high speed motion estimation in H.264/AVC

2008 ◽  
Vol 5 (21) ◽  
pp. 889-894
Author(s):  
Jinha Choi ◽  
Wonjae Lee ◽  
Yunho Jung ◽  
Jaeseok Kim
Keyword(s):  
Motion Estimation ◽  
High Speed ◽  
Motion Vector ◽  
Prediction Scheme ◽  
Motion Vector Prediction

Ultra‐Sensitive and Stretchable Ionic Skins for High‐Precision Motion Monitoring

2021 ◽  
pp. 2010199
Author(s):  
Jeong Hui Kim ◽  
Kyung Gook Cho ◽  
Dae Hyun Cho ◽  
Kihyon Hong ◽  
Keun Hyung Lee
Keyword(s):  
High Precision ◽  
Precision Motion

scholarly journals Compensation of Hysteresis in Hybrid Reluctance Actuator for High-Precision Motion

2019 ◽  
Vol 52 (15) ◽  
pp. 477-482 ◽  
Author(s):  
Francesco Cigarini ◽  
Shingo Ito ◽  
Julian Konig ◽  
Andreas Sinn ◽  
Georg Schitter
Keyword(s):  
High Precision ◽  
Precision Motion

A Large Range Compliant Nano-Manipulator Supporting Electron Beam Lithography

2022 ◽  
pp. 1-48
Author(s):  
Yijie Liu ◽  
Zhen Zhang
Keyword(s):  
Electron Beam ◽  
Natural Frequency ◽  
High Precision ◽  
Electron Beam Lithography ◽  
Optimization Design ◽  
Large Range ◽  
Direct Write ◽  
Motion Stage ◽  
Cross Axis ◽  
Precision Motion

Abstract Electron beam lithography (EBL) is an important lithographic process of scanning a focused electron beam (e-beam) to direct write a custom pattern with nanometric accuracy. Due to the very limited field of the focused election beam, a motion stage is needed to move the sample to the e-beam field for processing large patterns. In order to eliminate the stitching error induced by the existing “step and scan” process, we in this paper propose a large range compliant nano-manipulator so that the manipulator and the election beam can be moved in a simultaneous manner. We also present an optimization design for the geometric parameters of the compliant manipulator under the vacuum environment. Experimental results demonstrate 1 mm × 1 mm travel range with high linearity, ~ 0.5% cross-axis error and 5 nm resolution. Moreover, the high natural frequency (~ 56 Hz) of the manipulator facilitates it to achieve high-precision motion of EBL.

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