Electronic conduction properties of TiO2 thin films under UV light irradiation

2011 ◽  
Author(s):  
Yusuke Watanabe ◽  
Yuji Muramoto ◽  
Noriyuki Shimizu
Keyword(s):  
Thin Films ◽  
Uv Light ◽  
Light Irradiation ◽  
Electronic Conduction ◽  
Uv Light Irradiation ◽  
Conduction Properties

Photocatalytic performance of Cu-doped titania thin films under UV light irradiation

2021 ◽  
Vol 553 ◽  
pp. 149535
Author(s):  
Elisa Moretti ◽  
Elti Cattaruzza ◽  
Cristina Flora ◽  
Aldo Talon ◽  
Eugenio Casini ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Performance ◽  
Uv Light ◽  
Light Irradiation ◽  
Uv Light Irradiation ◽  
Doped Titania

UV-light irradiation effects on oxide superconducting thin films

1991 ◽  
Vol 27 (2) ◽  
pp. 1544-1547 ◽  
Author(s):  
A. Enokihara ◽  
S. Kohiki ◽  
H. Higashino ◽  
K. Setsune ◽  
K. Wasa
Keyword(s):  
Thin Films ◽  
Uv Light ◽  
Light Irradiation ◽  
Superconducting Thin Films ◽  
Irradiation Effects ◽  
Uv Light Irradiation

X-Ray and UV-Light Irradiation Effects on Oxide Superconducting Thin Films

1993 ◽  
Vol 137-139 ◽  
pp. 153-164
Author(s):  
Akira Enokihara ◽  
Shigemi Kohiki ◽  
Kentaro Setsune ◽  
Kiyotaka Wasa
Keyword(s):  
Thin Films ◽  
Uv Light ◽  
Light Irradiation ◽  
Superconducting Thin Films ◽  
Irradiation Effects ◽  
X Ray ◽  
Uv Light Irradiation

Electrical Property of TiO2 Thin Film Deposited by RF Sputtering

2007 ◽  
Vol 127 ◽  
pp. 221-226
Author(s):  
Kiyozumi Niizuma ◽  
Takahiro Hayakawa ◽  
Yoshio Utsushikawa
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Property ◽  
Tio2 Thin Film ◽  
Uv Light ◽  
Anatase Phase ◽  
Rf Sputtering ◽  
Light Irradiation ◽  
Tio2 Thin Films ◽  
Uv Light Irradiation

The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ﾟ, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω･m to 1.4×10-2Ω･m with UV light irradiation.

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