UV-light irradiation effects on oxide superconducting thin films

A. Enokihara; S. Kohiki; H. Higashino; K. Setsune; K. Wasa

doi:10.1109/20.133478

UV-light irradiation effects on oxide superconducting thin films

IEEE Transactions on Magnetics ◽

10.1109/20.133478 ◽

1991 ◽

Vol 27 (2) ◽

pp. 1544-1547 ◽

Cited By ~ 2

Author(s):

A. Enokihara ◽

S. Kohiki ◽

H. Higashino ◽

K. Setsune ◽

K. Wasa

Keyword(s):

Thin Films ◽

Uv Light ◽

Light Irradiation ◽

Superconducting Thin Films ◽

Irradiation Effects ◽

Uv Light Irradiation

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X-Ray and UV-Light Irradiation Effects on Oxide Superconducting Thin Films

Materials Science Forum ◽

10.4028/www.scientific.net/msf.137-139.153 ◽

1993 ◽

Vol 137-139 ◽

pp. 153-164

Author(s):

Akira Enokihara ◽

Shigemi Kohiki ◽

Kentaro Setsune ◽

Kiyotaka Wasa

Keyword(s):

Thin Films ◽

Uv Light ◽

Light Irradiation ◽

Superconducting Thin Films ◽

Irradiation Effects ◽

X Ray ◽

Uv Light Irradiation

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UV Light Irradiation Effects on Bi2Sr2CaCu2Ox Superconducting Thin Films

Advances in Superconductivity II ◽

10.1007/978-4-431-68117-5_193 ◽

1990 ◽

pp. 891-894

Author(s):

A. Enokihara ◽

S. Kohiki ◽

K. Setsune ◽

K. Wasa

Keyword(s):

Thin Films ◽

Uv Light ◽

Light Irradiation ◽

Superconducting Thin Films ◽

Irradiation Effects ◽

Uv Light Irradiation

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Photocatalytic performance of Cu-doped titania thin films under UV light irradiation

Applied Surface Science ◽

10.1016/j.apsusc.2021.149535 ◽

2021 ◽

Vol 553 ◽

pp. 149535

Author(s):

Elisa Moretti ◽

Elti Cattaruzza ◽

Cristina Flora ◽

Aldo Talon ◽

Eugenio Casini ◽

...

Keyword(s):

Thin Films ◽

Photocatalytic Performance ◽

Uv Light ◽

Light Irradiation ◽

Uv Light Irradiation ◽

Doped Titania

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Preparation of pillared carbon thin films from the reduction of silylated graphite oxide by UV light irradiation and their size selective electrical response to various molecules

Carbon ◽

10.1016/j.carbon.2014.04.001 ◽

2014 ◽

Vol 75 ◽

pp. 271-276 ◽

Cited By ~ 7

Author(s):

Yoshiaki Matsuo ◽

Kenshiro Iwasa ◽

Taito Mimura ◽

Yuji Tachibana

Keyword(s):

Thin Films ◽

Graphite Oxide ◽

Uv Light ◽

Electrical Response ◽

Light Irradiation ◽

Uv Light Irradiation ◽

Carbon Thin Films

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Electronic properties of TiO2 thin films under UV light irradiation

2010 Annual Report Conference on Electrical Insulation and Dielectic Phenomena ◽

10.1109/ceidp.2010.5724029 ◽

2010 ◽

Author(s):

Y Watanabe ◽

Y Muramoto ◽

N Shimizu

Keyword(s):

Thin Films ◽

Electronic Properties ◽

Uv Light ◽

Light Irradiation ◽

Uv Light Irradiation

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Electronic conduction properties of TiO2 thin films under UV light irradiation

2011 Annual Report Conference on Electrical Insulation and Dielectric Phenomena ◽

10.1109/ceidp.2011.6232610 ◽

2011 ◽

Author(s):

Yusuke Watanabe ◽

Yuji Muramoto ◽

Noriyuki Shimizu

Keyword(s):

Thin Films ◽

Uv Light ◽

Light Irradiation ◽

Electronic Conduction ◽

Uv Light Irradiation ◽

Conduction Properties

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Critical influence of surface nitrogen species on the activity of N-doped TiO2 thin-films during photodegradation of stearic acid under UV light irradiation

Applied Catalysis B Environmental ◽

10.1016/j.apcatb.2014.06.010 ◽

2014 ◽

Vol 160-161 ◽

pp. 582-588 ◽

Cited By ~ 33

Author(s):

Raul Quesada-Cabrera ◽

Carlos Sotelo-Vazquez ◽

Jawwad A. Darr ◽

Ivan P. Parkin

Keyword(s):

Thin Films ◽

Stearic Acid ◽

Uv Light ◽

Light Irradiation ◽

Nitrogen Species ◽

Tio2 Thin Films ◽

Doped Tio2 ◽

Uv Light Irradiation

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Improvement of electrical and optical properties of ZnO thin films prepared by MOCVD using UV light irradiation and in situ H2 post-treatment

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2004.06.005 ◽

2005 ◽

Vol 86 (1) ◽

pp. 105-112 ◽

Cited By ~ 17

Author(s):

Seung Yeop Myong ◽

Koeng Su Lim

Keyword(s):

Thin Films ◽

Optical Properties ◽

Uv Light ◽

Post Treatment ◽

Light Irradiation ◽

Zno Thin Films ◽

Electrical And Optical Properties ◽

Uv Light Irradiation

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Electrical Property of TiO2 Thin Film Deposited by RF Sputtering

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.127.221 ◽

2007 ◽

Vol 127 ◽

pp. 221-226

Author(s):

Kiyozumi Niizuma ◽

Takahiro Hayakawa ◽

Yoshio Utsushikawa

Keyword(s):

Thin Film ◽

Thin Films ◽

Electrical Property ◽

Tio2 Thin Film ◽

Uv Light ◽

Anatase Phase ◽

Rf Sputtering ◽

Light Irradiation ◽

Tio2 Thin Films ◽

Uv Light Irradiation

The authors investigated on the electrical property and the photo-catalytic activity of TiO2 thin films deposited in Ar+O2 atmosphere by RF magnetron sputtering. From the result of x-ray diffraction, the anatase phase was formed in TiO2 thin films. In TiO2 thin film deposited under a gas pressure of 3.0Pa, the contact angle of water showed 9 ﾟ, and the decomposition rate of Methylene Blue (measuring the absorbance of the reference light) showed -0.067 with UV light irradiation. Moreover, it revealed that the electric resistivity of TiO2 thin film deposited under the same conditions decreased from 8.0×103Ω･m to 1.4×10-2Ω･m with UV light irradiation.

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Study by real time ellipsometry of the growth of amorphous and microcrystalline silicon thin films combining glow discharge decomposition and UV light irradiation

Thin Solid Films ◽

10.1016/0040-6090(93)90108-2 ◽

1993 ◽

Vol 233 (1-2) ◽

pp. 281-285 ◽

Cited By ~ 12

Author(s):

N. Layadi ◽

P. Roca i Cabarrocas ◽

V. Yakovlev ◽

B. Drévillon

Keyword(s):

Thin Films ◽

Glow Discharge ◽

Real Time ◽

Uv Light ◽

Light Irradiation ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Uv Light Irradiation

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