A study of boron doping profile control for a low V/sub t/ device used in the advanced low power, high speed mixed-signal IC
Keyword(s):
2004 ◽
Vol 39
(12)
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pp. 2446-2456
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2005 ◽
Vol 15
(03)
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pp. 599-614
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Keyword(s):
2015 ◽
Vol 04
(04)
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pp. 670-675