In-situ Microwave Characterization of Medium-k HfO2 and High-k STO Dielectrics for MIM Capacitors Integrated in Back-End of Line of IC
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2000 ◽
Vol 48
(3)
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pp. 388-394
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2010 ◽
Vol 87
(3)
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pp. 301-305
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2005 ◽
Vol 82
(3-4)
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pp. 548-553
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