scholarly journals Proximity effect and hot-electron diffusion in Ag/Al/sub 2/O/sub 3//Al tunnel junctions

1997 ◽  
Vol 7 (2) ◽  
pp. 3379-3382 ◽  
Author(s):  
H. Netel ◽  
J. Jochum ◽  
S.E. Labov ◽  
C.A. Mears ◽  
M. Frank ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Tunnel Junctions ◽  
Hot Electron ◽  
Electron Diffusion

Hot electron diffusion in fine line semiconductor devices

1982 ◽  
Vol 25 (10) ◽  
pp. 1017-1021 ◽  
Author(s):  
W.T. Jones ◽  
K. Hess ◽  
G.J. Iafrate
Keyword(s):  
Semiconductor Devices ◽  
Hot Electron ◽  
Electron Diffusion ◽  
Fine Line

scholarly journals Tracking ultrafast hot-electron diffusion in space and time by ultrafast thermomodulation microscopy

2019 ◽  
Vol 5 (5) ◽  
pp. eaav8965 ◽  
Author(s):  
A. Block ◽  
M. Liebel ◽  
R. Yu ◽  
M. Spector ◽  
Y. Sivan ◽  
...  
Keyword(s):  
Three Dimensional ◽  
Nonequilibrium Dynamics ◽  
Hot Electron ◽  
Temperature Model ◽  
Three Dimensional Model ◽  
Electron Diffusion ◽  
Diffusion Dynamics ◽  
Electron Phonon Coupling ◽  
20 Nm ◽  
Two Temperature

The ultrafast response of metals to light is governed by intriguing nonequilibrium dynamics involving the interplay of excited electrons and phonons. The coupling between them leads to nonlinear diffusion behavior on ultrashort time scales. Here, we use scanning ultrafast thermomodulation microscopy to image the spatiotemporal hot-electron diffusion in thin gold films. By tracking local transient reflectivity with 20-nm spatial precision and 0.25-ps temporal resolution, we reveal two distinct diffusion regimes: an initial rapid diffusion during the first few picoseconds, followed by about 100-fold slower diffusion at longer times. We find a slower initial diffusion than previously predicted for purely electronic diffusion. We develop a comprehensive three-dimensional model based on a two-temperature model and evaluation of the thermo-optical response, taking into account the delaying effect of electron-phonon coupling. Our simulations describe well the observed diffusion dynamics and let us identify the two diffusion regimes as hot-electron and phonon-limited thermal diffusion, respectively.

scholarly journals Probing momentum distributions in magnetic tunnel junctions via hot-electron decay

2007 ◽  
Vol 90 (19) ◽  
pp. 192503 ◽  
Author(s):  
R. Jansen ◽  
T. Banerjee ◽  
B. G. Park ◽  
J. C. Lodder
Keyword(s):  
Tunnel Junctions ◽  
Magnetic Tunnel Junctions ◽  
Hot Electron ◽  
Momentum Distributions

PROXIMITY EFFECT TUNNEL JUNCTIONS WITH BARRIERS FORMED FROM AMORPHOUS ALLOYS

1978 ◽  
Vol 39 (C6) ◽  
pp. C6-1240-C6-1242
Author(s):  
R. B. Laibowitz ◽  
C. C. Tsuei ◽  
P. Chaudhari ◽  
S. I. Raider ◽  
R. Drake ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Amorphous Alloys ◽  
Tunnel Junctions

scholarly journals Proximity effect in Nb/Al, AlOoxide, Al/Nb Josephson tunnel junctions

1993 ◽  
Vol 3 (1) ◽  
pp. 2170-2173 ◽  
Author(s):  
E.P. Houwman ◽  
J.G. Gijsbertsen ◽  
J. Flokstra ◽  
H. Rogalla ◽  
J.B. le Grand ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Tunnel Junctions ◽  
Josephson Tunnel ◽  
Josephson Tunnel Junctions
Sign in / Sign up

Export Citation Format

Share Document