Dual work function metal gate CMOS technology using metal interdiffusion

I. Polishchuk; P. Ranade;  Tsu-Jae King;  Chenming Hu

doi:10.1109/55.944334

Dual work function metal gate CMOS technology using metal interdiffusion

IEEE Electron Device Letters ◽

10.1109/55.944334 ◽

2001 ◽

Vol 22 (9) ◽

pp. 444-446 ◽

Cited By ~ 132

Author(s):

I. Polishchuk ◽

P. Ranade ◽

Tsu-Jae King ◽

Chenming Hu

Keyword(s):

Work Function ◽

Cmos Technology ◽

Metal Gate

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Continuous and Precise Work Function Adjustment for Integratable Dual Metal Gate CMOS Technology Using Hf–Mo Binary Alloys

IEEE Transactions on Electron Devices ◽

10.1109/ted.2005.848108 ◽

2005 ◽

Vol 52 (6) ◽

pp. 1172-1179 ◽

Cited By ~ 41

Author(s):

T.-L. Li ◽

C.-H. Hu ◽

W.-L. Ho ◽

H.C.-H. Wang ◽

C.-Y. Chang

Keyword(s):

Work Function ◽

Binary Alloys ◽

Cmos Technology ◽

Metal Gate ◽

Dual Metal

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Metal gate work function engineering for future CMOS technology nodes

10.47749/t/unicamp.2015.957807 ◽

2015 ◽

Author(s):

Lucas Petersen Barbosa Lima

Keyword(s):

Work Function ◽

Cmos Technology ◽

Metal Gate ◽

Technology Nodes ◽

Gate Work Function

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Metal gate work function adjustment for future CMOS technology

2001 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.01 CH37184) ◽

10.1109/vlsit.2001.934939 ◽

2002 ◽

Cited By ~ 1

Author(s):

Qiang Lu ◽

R. Lin ◽

P. Ranade ◽

Tsu-Jae King ◽

Chenming Hu

Keyword(s):

Work Function ◽

Cmos Technology ◽

Metal Gate ◽

Gate Work Function

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Dual-work-function modulation for Ni-FUSI metal gate CMOS technology

2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings ◽

10.1109/icsict.2006.306292 ◽

2006 ◽

Author(s):

Huajie Zhou ◽

Qiuxia Xu

Keyword(s):

Work Function ◽

Cmos Technology ◽

Metal Gate

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Grain-Orientation Induced Work Function Variation in Nanoscale Metal-Gate Transistors—Part II: Implications for Process, Device, and Circuit Design

IEEE Transactions on Electron Devices ◽

10.1109/ted.2010.2063270 ◽

2010 ◽

Vol 57 (10) ◽

pp. 2515-2525 ◽

Cited By ~ 58

Author(s):

Hamed F Dadgour ◽

Kazuhiko Endo ◽

Vivek K De ◽

Kaustav Banerjee

Keyword(s):

Work Function ◽

Circuit Design ◽

Grain Orientation ◽

Metal Gate

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Analysis on Variations of Metal Gate Work Function on Junctionless Double Gate MOSFET with High-k Spacers

2020 International Conference on Emerging Trends in Communication, Control and Computing (ICONC3) ◽

10.1109/iconc345789.2020.9117425 ◽

2020 ◽

Author(s):

Gaurav Dhiman ◽

Rajeev Pourush

Keyword(s):

Work Function ◽

Double Gate ◽

Metal Gate ◽

High K ◽

Double Gate Mosfet ◽

Gate Work Function

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Analysis of USJ Formation with Combined RTA/Laser Annealing Conditions for 28nm High-K/Metal Gate CMOS Technology Using Advanced TCAD for Process and Device Simulation

2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) ◽

10.1109/istdm.2012.6222439 ◽

2012 ◽

Cited By ~ 1

Author(s):

E. M. Bazizi ◽

S. M. Pandey ◽

C. Wang ◽

I. Jiang ◽

S. Chu ◽

...

Keyword(s):

Laser Annealing ◽

Device Simulation ◽

Cmos Technology ◽

Metal Gate ◽

Annealing Conditions ◽

High K

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Effective Work-Function Modulation by Aluminum-Ion Implantation for Metal-Gate Technology $(\hbox{Poly-Si/TiN/SiO}_{2})$

IEEE Electron Device Letters ◽

10.1109/led.2007.909852 ◽

2007 ◽

Vol 28 (12) ◽

pp. 1089-1091 ◽

Cited By ~ 28

Author(s):

R. Singanamalla ◽

H. Y. Yu ◽

B. Van Daele ◽

S. Kubicek ◽

K. De Meyer

Keyword(s):

Ion Implantation ◽

Work Function ◽

Metal Gate ◽

Effective Work ◽

Effective Work Function ◽

Aluminum Ion

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Investigating doping effects on high-κ metal gate stack for effective work function engineering

Solid-State Electronics ◽

10.1016/j.sse.2013.04.011 ◽

2013 ◽

Vol 88 ◽

pp. 21-26 ◽

Cited By ~ 12

Author(s):

C. Leroux ◽

S. Baudot ◽

M. Charbonnier ◽

A. Van Der Geest ◽

P. Caubet ◽

...

Keyword(s):

Work Function ◽

Metal Gate ◽

Gate Stack ◽

Effective Work ◽

Effective Work Function ◽

Doping Effects

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Electronic structure and work function of metal gate Mo–W system

Applied Physics Letters ◽

10.1063/1.2776851 ◽

2007 ◽

Vol 91 (9) ◽

pp. 092106 ◽

Cited By ~ 9

Author(s):

H. R. Gong ◽

Kyeongjae Cho

Keyword(s):

Electronic Structure ◽

Work Function ◽

Metal Gate

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