A novel technology to reduce the antenna charging effects during polysilicon gate electron-cyclotron-resonance etching

1996 ◽  
Vol 17 (7) ◽  
pp. 338-340 ◽  
Author(s):  
Huang-Chung Cheng ◽  
Tzong-Kuei Kang ◽  
Tzun-Kun Ku ◽  
Bau-Tong Dai ◽  
Liang-Po Chen
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Novel Technology ◽  
Polysilicon Gate

Antenna Charging Effects on the Electrical Characteristics of Polysilicon Gate during Electron Cyclotron Resonance Etching

1996 ◽  
Vol 35 (Part 1, No. 2A) ◽  
pp. 578-583
Author(s):  
Tzong-Kuei Kang ◽  
Shih-Yuan Ueng ◽  
Bau-Tong Dai ◽  
Liang-Po Chen ◽  
Huang-Chung Cheng
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electrical Characteristics ◽  
Polysilicon Gate

Anisotropic electron cyclotron resonance etching of tungsten films on GaAs

1994 ◽  
Vol 30 (1) ◽  
pp. 84-85 ◽  
Author(s):  
R.J. Shul ◽  
D.J. Rieger ◽  
C. Constantine ◽  
A.G. Baca ◽  
C. Barratt
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron

Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

1990 ◽  
Vol 56 (15) ◽  
pp. 1424-1426 ◽  
Author(s):  
S. J. Pearton ◽  
U. K. Chakrabarti ◽  
A. P. Kinsella ◽  
D. Johnson ◽  
C. Constantine
Keyword(s):  
Plasma Etching ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Electron Cyclotron Resonance Plasma ◽  
Resonance Plasma
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