Effects of nonradiative recombination on the temperature characteristics of threshold current density in 670 nm GaInAsP-AlGaAs visible lasers

1991 ◽  
Vol 27 (6) ◽  
pp. 1501-1510 ◽  
Author(s):  
T.-H. Chong ◽  
K. Kishino
Keyword(s):  
Current Density ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Nonradiative Recombination ◽  
Temperature Characteristics ◽  
Visible Lasers

Effects of strained‐layer structures on the threshold current density of AlGaInP/GaInP visible lasers

1991 ◽  
Vol 58 (9) ◽  
pp. 879-880 ◽  
Author(s):  
Jun‐ichi Hashimoto ◽  
Tsukuru Katsuyama ◽  
Jiro Shinkai ◽  
Ichiro Yoshida ◽  
Hideki Hayashi
Keyword(s):  
Current Density ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Strained Layer ◽  
Layer Structures ◽  
Visible Lasers

InGaN/GaN/AlGaN-Based Leds and Laser Diodes

1998 ◽  
Vol 537 ◽  
Author(s):  
S. Nakamura ◽  
M. Senoh ◽  
S. Nagahama ◽  
N. Iwasa ◽  
T. Matushita ◽  
...  
Keyword(s):  
Quantum Well ◽  
Leakage Current ◽  
Output Power ◽  
Current Density ◽  
Laser Diodes ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Nonradiative Recombination ◽  
Window Region ◽  
Recombination Centers

AbstractInGaN quantum-well-structure blue LEDs were grown on epitaxially laterally overgrown GaN (ELOG) and sapphire substrates. The output power of both LEDs was as high as 6 mW at a current of 20 mA. The LED on sapphire had a considerable amount of leakage current in comparison with that on ELOG. These results indicate that In composition fluctuation is not caused by threading dislocations (TDs), free carriers are captured by radiative recombination centers before they are captured by nonradiative recombination centers in InGaN, and that the dislocations form the leakage current pathway in InGaN. Red LED with an emission peak wavelength of 650 nm was fabricated by increasing the In composition and thickness of InGaN well layer. When the laser diodes (LD) was formed on the GaN layer above the SiO2 mask region, the threshold current density was as low as 3 kAcm-2. When the LD was formed on the window region, the threshold current density was as high as 6 to 9 kAcm-2. There is a possibility that a leakage current due to a large number of TDs caused the high threshold current density on the window region. InGaN multi-quantum-well (MQW) structure LDs grown on the ELOG substrate showed an output power as high as 420 mW under RT-CW operation. The longest lifetime of 9,800 hours at a constant output power of 2 mW was achieved. The InGaN MQW LDs were fabricated on a GaN substrate. The fundamental transverse mode was observed up to an output power of 80 mW.

scholarly journals Performance deterioration of GaN-based laser diode by V-pits in the upper waveguide layer

Nanophotonics ◽  
2020 ◽  
Vol 9 (3) ◽  
pp. 667-674
Author(s):  
Feng Liang ◽  
Degang Zhao ◽  
Desheng Jiang ◽  
Wenjie Wang ◽  
Zongshun Liu ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Current Density ◽  
Optical Loss ◽  
Optical Power ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Device Performance ◽  
Nonradiative Recombination ◽  
Calculation Results ◽  
Performance Deterioration

AbstractThe effect of V-pits in the upper waveguide (UWG) on device performance of GaN-based laser diodes (LDs) has been studied. Experimental results demonstrate that in comparison with the LDs with u-In0.017Ga0.983N/u-GaN multiple UWG or u-In0.017Ga0.983N one, the LDs with a single u-GaN UWG has the best device performance. They have a smaller threshold current density, and a larger and more stable output optical power. The lowest threshold current density is as low as 1.3 kA/cm2, and the optical power reaches to 2.77 W. Furthermore, atomic force microscopy suggests that the deterioration of device performance of former kinds of devices may be attributed to the increase of V-pits’ size and quantity in the undoped-In0.017Ga0.983N UWG layer, and these V-pits could introduce more nonradiative recombination centers and exacerbate the inhomogeneity of injection current. Moreover, theoretical calculation results indicate that the increase of leakage current and optical loss are additional reasons for the device performance deterioration, which may be caused by a reduction of the potential barrier height for electrons in the quantum wells and by an increased background electron concentration in UWG.

scholarly journals InGaN/GaN/AlGaN-Based Leds and Laser Diodes

1999 ◽  
Vol 4 (S1) ◽  
pp. 1-17 ◽  
Author(s):  
S. Nakamura ◽  
M. Senoh ◽  
S. Nagahama ◽  
N. Iwasa ◽  
T. Matushita ◽  
...  
Keyword(s):  
Quantum Well ◽  
Leakage Current ◽  
Output Power ◽  
Current Density ◽  
Laser Diodes ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Nonradiative Recombination ◽  
Window Region ◽  
Recombination Centers

InGaN quantum-well-structure blue LEDs were grown on epitaxially laterally overgrown GaN (ELOG) and sapphire substrates. The output power of both LEDs was as high as 6 mW at a current of 20 mA. The LED on sapphire had a considerable amount of leakage current in comparison with that on ELOG. These results indicate that In composition fluctuation is not caused by threading dislocations (TDs), free carriers are captured by radiative recombination centers before they are captured by nonradiative recombination centers in InGaN, and that the dislocations form the leakage current pathway in InGaN. Red LED with an emission peak wavelength of 650 nm was fabricated by increasing the In composition and thickness of InGaN well layer. When the laser diodes (LD) was formed on the GaN layer above the SiO2 mask region, the threshold current density was as low as 3 kAcm−2. When the LD was formed on the window region, the threshold current density was as high as 6 to 9 kAcm−2. There is a possibility that a leakage current due to a large number of TDs caused the high threshold current density on the window region. InGaN multi-quantum-well (MQW) structure LDs grown on the ELOG substrate showed an output power as high as 420 mW under RT-CW operation. The longest lifetime of 9,800 hours at a constant output power of 2 mW was achieved. The InGaN MQW LDs were fabricated on a GaN substrate. The fundamental transverse mode was observed up to an output power of 80 mW.

Low Threshold Current Density (100) GaInAsP/InP Double-Heterostructure Lasers for Wavelength 1.3 µm

1979 ◽  
Vol 18 (9) ◽  
pp. 1795-1805 ◽  
Author(s):  
Yoshio Itaya ◽  
Yasuharu Suematsu ◽  
Shinya Katayama ◽  
Katsumi Kishino ◽  
Shigehisa Arai
Keyword(s):  
Current Density ◽  
Threshold Current ◽  
Threshold Current Density ◽  
Double Heterostructure ◽  
Low Threshold
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