Growth optimization for p-n junction placement in the integration of heterojunction bipolar transistors and quantum well modulators on InP

2000 ◽  
Vol 6 (1) ◽  
pp. 26-30 ◽  
Author(s):  
M.T. Camargo Silva ◽  
J.E. Zucker ◽  
L.R. Carrion ◽  
C.H. Joyner ◽  
A.G. Dentai
Keyword(s):  
Quantum Well ◽  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Growth Optimization

Monolithic integration of heterojunction bipolar transistors and quantum well modulators on InP: growth optimization

1997 ◽  
Author(s):  
Milson T. Camargo Silva ◽  
Jane E. Zucker ◽  
Luiz R. Carrion ◽  
Charles H. Joyner ◽  
Andrew G. Dentai ◽  
...  
Keyword(s):  
Quantum Well ◽  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Monolithic Integration ◽  
Growth Optimization

Integration of Heterojunction Bipolar Transistors and Shallow Quantum Well Modulators for Smart Pixel Fabrication

1992 ◽  
Vol 261 ◽  
Author(s):  
K. W. Goossen ◽  
J. E. Cunningham ◽  
W. Y. Jan ◽  
J. A. Walker
Keyword(s):  
Quantum Well ◽  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Single Stage ◽  
Smart Pixel ◽  
Smart Pixels

ABSTRACTUsing the recently developed SESHL (for Single Epitaxy Supporting HBT and Low-barrier modulator) process, we present a monolithic single-stage common-emitter amplifier with photodiode input and modulator output (or HBT-SEED), one of the simplest forms of smart pixels.

TEM evaluation of graded SixGe1-x heterolayers

1991 ◽  
Vol 49 ◽  
pp. 894-895
Author(s):  
N. David Theodore ◽  
Mamoru Tomozane ◽  
Ming Liaw
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Gas Flow ◽  
Field Effect Transistors ◽  
Chemical Vapor ◽  
Dark Field ◽  
Bipolar Transistors ◽  
Structural Quality ◽  
Weak Beam ◽  
Transmission Electron ◽  
And Behavior

There is extensive interest in SiGe for use in heterojunction bipolar transistors. SiGe/Si superlattices are also of interest because of their potential for use in infrared detectors and field-effect transistors. The processing required for these materials is quite compatible with existing silicon technology. However, before SiGe can be used extensively for devices, there is a need to understand and then control the origin and behavior of defects in the materials. The present study was aimed at investigating the structural quality of, and the behavior of defects in, graded SiGe layers grown by chemical vapor deposition (CVD).The structures investigated in this study consisted of Si1-xGex[x=0.16]/Si1-xGex[x= 0.14, 0.13, 0.12, 0.10, 0.09, 0.07, 0.05, 0.04, 0.005, 0]/epi-Si/substrate heterolayers grown by CVD. The Si1-xGex layers were isochronally grown [t = 0.4 minutes per layer], with gas-flow rates being adjusted to control composition. Cross-section TEM specimens were prepared in the 110 geometry. These were then analyzed using two-beam bright-field, dark-field and weak-beam images. A JEOL JEM 200CX transmission electron microscope was used, operating at 200 kV.

TEM study of phosphorus-implanted pseudomorphic Si0.88Ge0.12 on Si(100)

1995 ◽  
Vol 53 ◽  
pp. 468-469
Author(s):  
N. David Theodore ◽  
Donald Y.C Lie ◽  
J. H. Song ◽  
Peter Crozier
Keyword(s):  
Integrated Circuits ◽  
Heterojunction Bipolar Transistors ◽  
Integrated Circuit ◽  
High Speed ◽  
Room Temperature ◽  
Strain Relaxation ◽  
Bipolar Transistors ◽  
Sige Hbt ◽  
Integrated Circuit Manufacturing ◽  
Microstructural Behavior

SiGe is being extensively investigated for use in heterojunction bipolar-transistors (HBT) and high-speed integrated circuits. The material offers adjustable bandgaps, improved carrier mobilities over Si homostructures, and compatibility with Si-based integrated-circuit manufacturing. SiGe HBT performance can be improved by increasing the base-doping or by widening the base link-region by ion implantation. A problem that arises however is that implantation can enhance strain-relaxation of SiGe/Si.Furthermore, once misfit or threading dislocations result, the defects can give rise to recombination-generation in depletion regions of semiconductor devices. It is of relevance therefore to study the damage and anneal behavior of implanted SiGe layers. The present study investigates the microstructural behavior of phosphorus implanted pseudomorphic metastable Si0.88Ge0.12 films on silicon, exposed to various anneals.Metastable pseudomorphic Si0.88Ge0.12 films were grown ~265 nm thick on a silicon wafer by molecular-beam epitaxy. Pieces of this wafer were then implanted at room temperature with 100 keV phosphorus ions to a dose of 1.5×1015 cm-2.

(GaAl)As/GaAs heterojunction bipolar transistors with graded composition in the base

1983 ◽  
Vol 19 (10) ◽  
pp. 367 ◽  
Author(s):  
D.L. Miller ◽  
P.M. Asbeck ◽  
R.J. Anderson ◽  
F.H. Eisen
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors

17 Gbit/s pin-PD/decision circuit using InP/InGaAs double-heterojunction bipolar transistors

1996 ◽  
Vol 32 (4) ◽  
pp. 393 ◽  
Author(s):  
M. Yoneyama ◽  
E. Sano ◽  
S. Yamahata ◽  
Y. Matsuoka ◽  
M. Yaita
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Double Heterojunction ◽  
Decision Circuit

InAs-based heterojunction bipolar transistors

2002 ◽  
Vol 38 (7) ◽  
pp. 344 ◽  
Author(s):  
S. Maimon ◽  
K.L. Averett ◽  
X. Wu ◽  
M.W. Koch ◽  
G.W. Wicks
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors

Excess noise in AlGaAs/GaAs heterojunction bipolar transistors and associated TLM test structures

1994 ◽  
Vol 41 (11) ◽  
pp. 2000-2005 ◽  
Author(s):  
C. Delseny ◽  
F. Pascal ◽  
S. Jarrix ◽  
G. Lecoy ◽  
J. Dangla ◽  
...  
Keyword(s):  
Heterojunction Bipolar Transistors ◽  
Bipolar Transistors ◽  
Excess Noise
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