Direct simulation Monte Carlo analysis of flows and etch rate in an inductively coupled plasma reactor

1999 ◽  
Vol 27 (5) ◽  
pp. 1379-1388 ◽  
Author(s):  
K. Nanbu ◽  
T. Morimoto ◽  
M. Suetani
Keyword(s):  
Monte Carlo ◽  
Inductively Coupled Plasma ◽  
Etch Rate ◽  
Plasma Reactor ◽  
Direct Simulation Monte Carlo ◽  
Monte Carlo Analysis ◽  
Direct Simulation ◽  
Inductively Coupled ◽  
Inductively Coupled Plasma Reactor ◽  
Simulation Monte Carlo

Direct Simulation Monte Carlo of Inductively Coupled Plasma and Comparison with Experiments

1997 ◽  
Vol 144 (7) ◽  
pp. 2448-2455 ◽  
Author(s):  
Justine Johannes ◽  
Timothy Bartel ◽  
Gregory A. Hebner ◽  
Joseph Woodworth ◽  
Demetre J. Economou
Keyword(s):  
Monte Carlo ◽  
Inductively Coupled Plasma ◽  
Direct Simulation Monte Carlo ◽  
Direct Simulation ◽  
Inductively Coupled ◽  
Simulation Monte Carlo ◽  
Comparison With Experiments
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