Kinetic modeling of positive ions in a low-pressure RF discharge

1991 ◽  
Vol 19 (2) ◽  
pp. 245-249 ◽  
Author(s):  
W.J. Goedheer ◽  
P.M. Meijer
Materials ◽  
2020 ◽  
Vol 13 (17) ◽  
pp. 3852
Author(s):  
Bongjun Gu ◽  
Dongwook Ko ◽  
Sungjin Jo ◽  
Dong Choon Hyun ◽  
Hyeon-Ju Oh ◽  
...  

Wrinkles attract significant attention due to their ability to enhance the mechanical and optical characteristics of various optoelectronic devices. We report the effect of the plasma gas type, power, flow rate, and treatment time on the wrinkle features. When an optical adhesive was treated using a low-pressure plasma of oxygen, argon, and nitrogen, the oxygen and argon plasma generated wrinkles with the lowest and highest wavelengths, respectively. The increase in the power of the nitrogen and oxygen plasma increased the wavelengths and heights of the wrinkles; however, the increase in the power of the argon plasma increased the wavelengths and decreased the heights of the wrinkles. Argon molecules are heavier and smaller than nitrogen and oxygen molecules that have similar weights and sizes; moreover, the argon plasma comprises positive ions while the oxygen and nitrogen plasma comprise negative ions. This resulted in differences in the wrinkle features. It was concluded that a combination of different plasma gases could achieve exclusive control over either the wavelength or the height and allow a thorough analysis of the correlation between the wrinkle features and the characteristics of the electronic devices.


2004 ◽  
Vol 54 (S3) ◽  
pp. C877-C882 ◽  
Author(s):  
Z. Navrátil ◽  
V. Buršíková ◽  
P. St’ahel ◽  
M. Šíra ◽  
P. Zvěřina

2010 ◽  
Vol 157 (9) ◽  
pp. 1686-1697 ◽  
Author(s):  
Lidong Zhang ◽  
Jianghuai Cai ◽  
Taichang Zhang ◽  
Fei Qi

2005 ◽  
Vol 8 (1) ◽  
Author(s):  
Jeou-Long Lee ◽  
Chung-Ming Liu ◽  
Kuen Ting ◽  
Wei-Kung Cheng ◽  
Takayoshi Tsuchida ◽  
...  

AbstractSurface modification of the carbon included polyethylene (semi-conductive PE) surface for metallizing using a low pressure RF discharge plasma has been carried out. The contact angle was used as a measure of the wettability of the PE surface. The roughness and the chemical bondings in PE surface layer were analized by DFM and XPS, respectively. Typical results show that the contact angle decreases from approximately 94° to below 10° after several minutes' treatment and recovers to a saturation value when it was put open to the air after treatment. The saturation value of the contact angle is smaller as the gas pressure for treatment is higher and the treatment time is longer but all are below approximately 60° which is still smaller than that of untreated. DFM and XPS results show that the surface roughness and the bondings C-O and C=O in the PE surface layer also increase with increasing the treatment time and seem to be responsible for improving the hydrophilic property of PE. After pretreatment process, nickel was coated on the PE sheet by electrodeposition method and a good adhesion between the nickel layer and the PE surface compared with that of untreated was obtained.


2016 ◽  
Vol 108 (19) ◽  
pp. 194102 ◽  
Author(s):  
Sergey O. Macheret ◽  
Siva Sashank Tholeti ◽  
Alina A. Alexeenko

2019 ◽  
Vol 13 (27) ◽  
pp. 76-82
Author(s):  
Kadhim A. Aadim

Low-pressure capacitively coupled RF discharge Ar plasma has been studied using Langmuir probe. The electron temperature, electron density and Debay length were calculated under different pressures and electrode gap. In this work the RF Langmuir probe is designed using 4MHz filter as compensation circuit and I-V probe characteristic have been investigated. The pressure varied from 0.07 mbar to 0.1 mbar while electrode gap varied from 2-5 cm. The plasma was generated using power supply at 4MHz frequency with power 300 W. The flowmeter is used to control Argon gas flow in the range of 600 standard cubic centimeters per minute (sccm). The electron temperature drops slowly with pressure and it's gradually decreased when expanding the electrode gap. As the gas pressure increases, the plasma density rises slightly at low gas pressure while it drops little at higher gas pressure. The electron density decreases rapidly with expand distances between electrodes.


2013 ◽  
Vol 34 (1) ◽  
pp. 1785-1793 ◽  
Author(s):  
Zhandong Wang ◽  
Yuyang Li ◽  
Feng Zhang ◽  
Lidong Zhang ◽  
Wenhao Yuan ◽  
...  

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