Interface-state generation under radiation and high-field stressing in reoxidized nitrided oxide MOS capacitors
1992 ◽
Vol 39
(6)
◽
pp. 2230-2235
◽
1995 ◽
Vol 38
(2)
◽
pp. 477-480
◽
Keyword(s):
1990 ◽
Vol 41-42
◽
pp. 420-424
◽
Keyword(s):
1995 ◽
Vol 142
(3)
◽
pp. 1021-1024
◽
Keyword(s):
1993 ◽
Vol 22
(1-4)
◽
pp. 219-222
◽