Superconducting thin films of BiSrCaCuO made by sequential electron beam evaporation

1989 ◽  
Vol 25 (2) ◽  
pp. 2429-2432
Author(s):  
J. Steinbeck ◽  
A.C. Anderson ◽  
B.Y. Tsaur ◽  
A.J. Strauss
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Beam Evaporation ◽  
Superconducting Thin Films ◽  
Sequential Electron

Production of YBa2Cu3O7?x superconducting thin films by pulsed pseudospark electron beam evaporation

1989 ◽  
Vol 48 (4) ◽  
pp. 397-400 ◽  
Author(s):  
H. P. Sch�lch ◽  
P. Fickenscher ◽  
T. Redel ◽  
M. Stetter ◽  
G. Saemann-Ischenko ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Beam Evaporation ◽  
Superconducting Thin Films

X-ray Line Broadening Analysis of Tl-Superconducting Films

1989 ◽  
Vol 33 ◽  
pp. 145-151
Author(s):  
M. O. Eatough ◽  
D. S. Ginley ◽  
B. Morosin
Keyword(s):  
Thin Films ◽  
Superconducting Films ◽  
Electron Beam Evaporation ◽  
Superconducting Thin Films ◽  
Line Broadening ◽  
X Ray Diffraction ◽  
X Ray ◽  
Current Densities ◽  
Diffraction Peaks ◽  
Sequential Electron

AbstractSuperconducting thin films (0.3-0.7μm) in the TI-Ca-Ba-Cu-0 system have been prepared on various single crystal substrates by sequential electron beam evaporation followed by appropriate sintering and annealing. Oxygen-annealed films show Tc as high as 110K and critical current densities to 600,000 A/cm2. X-ray diffraction analyses of these films show predominantly the Tl2Ca2Ba2Cu2O10 phase (c-parameter near 36Å), but some also contain up to 50 at% of the Tl2CaBa2Cu2O8 phase (c-parameter near 30Å). The complete absence of hkl reflections other than 00I demonstrates the highly oriented nature of the films as well as the absence of other Tl phases. The diffraction peaks are noticeably broader for the 36Å phase than for the 30Å phase. For a 0.7μm film such broadening is consistent with coherent sizes along the c-axis of 1200 - 1400Å and 500Å, respectively, for the 30Å and 36Å phases, and of strain values near 1.4-1.8 x 10-3 for both phases.

A New Hybrid Pvd/Omcvd Route to High‐Tc Superconducting Thin Films of Tl‐Ba‐Ca‐Cu‐O

1989 ◽  
Vol 169 ◽  
Author(s):  
D. S. Richeson ◽  
L. M. Tonge ◽  
X. K. Wang ◽  
H. O. Marcy ◽  
T. J. Marks ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Water Vapor ◽  
Substrate Surface ◽  
Chemical Vapor ◽  
Electron Beam Evaporation ◽  
Hybrid Technique ◽  
Superconducting Thin Films ◽  
Zero Resistance ◽  
Oriented Parallel

AbstractSuperconducting thin films of Tl‐Ba‐Ca‐Cu‐0 have been prepared by a unique hybrid technique that combines electron beam evaporation with organometallic chemical vapor deposition (OMCVD). Multilayer thin films of Ba‐Ca‐Cu‐O are prepared by sequential electron beam evaporation of BaF2, CaF2, and Cu sources onto single crystal MgO (100) or yttria‐stabilized zirconia (YSZ) substrates followed by annealing in a water vapor‐saturated oxygen atmosphere. Thallium is then incorporated into these films in either of two ways: (1) via OMCVD using thallium(cyclopentadienide) as the source, or (2) rapid annealing of the Ba‐Ca‐Cu‐O film in the presence of bulk thallium superconductor. The resultant films primarily consist of single phase TlBa2Ca2Cu3Ox with the Cu‐O planes preferentially oriented parallel to the substrate surface. Resistivity measurements indicate superconducting onset temperatures above 120 K with zero resistance by 104 K. By eliminating the water vapor anneal, residual fluoride, originating from the sources, may be left in the film. This leads to formation of predominantly c‐axis oriented crystallites of the TlBa2CaCu2Ox phase.

AlN thin films fabricated by ultra-high vacuum electron-beam evaporation with ammonia for silicon-on-insulator application

2005 ◽  
Vol 239 (3-4) ◽  
pp. 327-334 ◽  
Author(s):  
Ming Zhu ◽  
Peng Chen ◽  
Ricky K.Y. Fu ◽  
Weili Liu ◽  
Chenglu Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
High Vacuum ◽  
Electron Beam Evaporation ◽  
Silicon On Insulator ◽  
Ultra High Vacuum
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