26.5 Gb/in/sup 2/ areal-density longitudinal thin film media

2000 ◽  
Vol 36 (5) ◽  
pp. 2143-2147 ◽  
Author(s):  
M.A. Schultz ◽  
S.S. Malhotra ◽  
B.B. Lal ◽  
J.M. Kimmal ◽  
M.A. Russak ◽  
...  
Keyword(s):  
Thin Film ◽  
Areal Density

Overcoats and Lubrication for Thin Film Disks

MRS Bulletin ◽  
1990 ◽  
Vol 15 (3) ◽  
pp. 45-52 ◽  
Author(s):  
A.M. Homola ◽  
C.M. Mate ◽  
G.B. Street
Keyword(s):  
Thin Film ◽  
Data Storage ◽  
Magnetic Particles ◽  
Areal Density ◽  
Magnetic Film ◽  
Alloy Thin Film ◽  
Magnetic Media ◽  
Disk Interface ◽  
Storage Devices ◽  
Particulate Media

Metallic alloy thin film media and ever decreasing head-to-media spacing make severe demands on storage devices. Decreasing head-to-media separation is critical for high storage densities but it also leads to increased slider-disk interactions, which can cause slider and disk wear or even head crashes. Wear can also occur when drives start and stop when the slider contacts the disk at relatively high speeds. The reliability and durability of thin film disks, which provide much higher areal density than conventional oxide disks with particulate media, are achieved by the use of very thin overcoat materials and surface lubricants. This article summarizes the approaches taken in the industry to enhance the tribological performance of magnetic media, with special emphasis on the basic understanding of the processes occurring at the slider-disk interface.The continuous rise in the demand for storage capacity at a competitive price is the prime motivator of the changes we have seen in the data storage industry. It is clearly stimulating the present move away from particulate media, which has long dominated all fields of data storage, i.e., tape, rigid, and flexible disks, to the thin film storage media. Particulate storage devices use magnetic media formulated by dispersing magnetic particles, usually iron oxides, in an organic binder. In thin film storage devices, the storage medium is a continuous magnetic film, usually a cobalt alloy, made either by sputtering or by electroless plating.

scholarly journals HIGH S/N THIN FILM MEDIA FOR 2 Gb/in2 AREAL DENSITY

1991 ◽  
Vol 15 (S_2_PMRC_91) ◽  
pp. S2_1001-1006 ◽  
Author(s):  
Yoshibumi MATSUDA ◽  
Nobuyuki INABA ◽  
Mikio SUZUKI ◽  
Hisashi TAKANO ◽  
Masaaki FUTAMOTO
Keyword(s):  
Thin Film ◽  
Areal Density

Process considerations for critical features in high areal density thin film magnetoresistive heads: A review

1999 ◽  
Vol 35 (2) ◽  
pp. 806-811 ◽  
Author(s):  
R.E. Fontana ◽  
S.A. MacDonald ◽  
H.A.A. Santini ◽  
C. Tsang
Keyword(s):  
Thin Film ◽  
Areal Density ◽  
Magnetoresistive Heads

26.5 Gb/in/sup 2/ areal-density longtudinal thin-film media

2005 ◽  
Author(s):  
M. Schultz ◽  
S. Malhotra ◽  
B. Lai ◽  
J. Kimmal ◽  
M. Russak ◽  
...  
Keyword(s):  
Thin Film ◽  
Areal Density

Stability and Oxidation Behavior of Ir Thin Film Electrodes on Si and SiO2

1998 ◽  
Vol 541 ◽  
Author(s):  
K.L. Saenger ◽  
A. Grill ◽  
T.M. Shaw ◽  
D.A. Neumayer ◽  
Chenting Lin ◽  
...  
Keyword(s):  
Thin Film ◽  
Oxidation Behavior ◽  
Layer Structure ◽  
Areal Density ◽  
Factors Affecting ◽  
Transmission Electron ◽  
Thin Film Electrodes ◽  
The Stability ◽  
20 Nm

AbstractThis paper examines factors affecting the oxidation behavior of Ir thin film electrodes and the stability of bilayer Ir/Ir-Ir-O-Si electrodes on silicon substrates. We first examine the morphology and texture of faceted IrO2 extrusions formed on the Ir films during thermal oxidation, and show that an Ir grain-growth anneal in N2 at 650°C for 5 min prior to the oxidation treatment increases both the areal density of IrO2 extrusions and the IrO2<110> x-ray diffraction intensity while decreasing apparent film roughness. We then examine the stability of bilayer lr(100 nm)/Ir(20 nm) films on polycrystalline silicon and show how fairly mild oxygen anneals of the Ir(20 nm)/Si structures can provide an in-situ formed Ir-O-Si barrier that protects the subsequently deposited Ir(100 nm) layer from silicidation reactions during annealing in N2 ambients at 750°C. Transmission electron microscopy indicates that this in-situ formed barrier at the Ir/Si interface has a two layer structure comprising an IrSix underlayer in contact with the silicon substrate and an SiO2 overlayer directly below the remaining Ir.

Clean Electron Microscope Substrate Films Used for Micrometeorite Collection and Study

1967 ◽  
Vol 25 ◽  
pp. 366-367
Author(s):  
D. M. Davies ◽  
R. Kemner ◽  
E. F. Fullam
Keyword(s):  
Thin Film ◽  
Electron Microscope ◽  
High Altitude ◽  
Amyl Acetate ◽  
Temperature Variations ◽  
Film Forming ◽  
Film Specimen ◽  
Particulate Contaminants

All serious electron microscopists at one time or another have been concerned with the cleanliness and freedom from artifacts of thin film specimen support substrates. This is particularly important where there are relatively few particles of a sample to be found for study, as in the case of micrometeorite collections. For the deposition of such celestial garbage through the use of balloons, rockets, and aircraft, the thin film substrates must have not only all the attributes necessary for use in the electron microscope, but also be able to withstand rather wide temperature variations at high altitude, vibration and shock inherent in the collection vehicle's operation and occasionally an unscheduled violent landing.Nitrocellulose has been selected as a film forming material that meets these requirements yet lends itself to a relatively simple clean-up procedure to remove particulate contaminants. A 1% nitrocellulose solution is prepared by dissolving “Parlodion” in redistilled amyl acetate from which all moisture has been removed.

Microtomy of spherical Al2O3 powders

1983 ◽  
Vol 41 ◽  
pp. 74-75
Author(s):  
E.J. Jenkins ◽  
D.S. Tucker ◽  
J.J. Hren
Keyword(s):  
Thin Film ◽  
Size Range ◽  
Particle Aggregation ◽  
Ion Milling ◽  
Thin Sections ◽  
Α Phase ◽  
Convenient Means ◽  
Van Der Waals Attraction ◽  
Negative Feature ◽  
Film Substrate

The size range of mineral and ceramic particles of one to a few microns is awkward to prepare for examination by TEM. Electrons can be transmitted through smaller particles directly and larger particles can be thinned by crushing and dispersion onto a substrate or by embedding in a film followed by ion milling. Attempts at dispersion onto a thin film substrate often result in particle aggregation by van der Waals attraction. In the present work we studied 1-10 μm diameter Al2O3 spheres which were transformed from the amprphous state to the stable α phase.After the appropriate heat treatment, the spherical powders were embedded in as high a density as practicable in a hard EPON, and then microtomed into thin sections. There are several advantages to this method. Obviously, this is a rapid and convenient means to study the microstructure of serial slices. EDS, ELS, and diffraction studies are also considerably more informative. Furthermore, confidence in sampling reliability is considerably enhanced. The major negative feature is some distortion of the microstructure inherent to the microtoming operation; however, this appears to have been surprisingly small. The details of the method and some typical results follow.

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