On the iterative schemes to obtain base doping profiles for reducing base transit time in a bipolar transistor

2001 ◽  
Vol 48 (6) ◽  
pp. 1222-1224 ◽  
Author(s):  
M. Jagadesh Kumar ◽  
V.S. Patri
Author(s):  
S. M. Moududul Islam ◽  
Yeasir Arafat ◽  
Iqbal Bahar Chowdhury ◽  
M. Ziaur Rahman Khan ◽  
M. M. Shahidul Hassan

1983 ◽  
Vol 13 ◽  
Author(s):  
C Hill

ABSTRACTA brief history and present state of beam processing techniques and applications to silicon integrated circuit technology are given. The viability of incorporating pulse-laser controlled doping profiles into the emitter-base structure of an advanced bipolar transistor is discussed. The areas of present I.C. technology which will constrain future device development are identified, and the contribution that beam processing can make in removing these constraints is discussed. The beam processing techniques most likely to be found in future I.C. technologies are described.


1996 ◽  
Vol 43 (1) ◽  
pp. 170-172 ◽  
Author(s):  
S.S. Winterton ◽  
S. Searles ◽  
C.J. Peters ◽  
N.G. Tarr ◽  
D.L. Pulfrey

2006 ◽  
Vol 50 (3) ◽  
pp. 327-332 ◽  
Author(s):  
M.M. Shahidul Hassan ◽  
Touhidur Rahman ◽  
Md. Ziaur Rahman Khan

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