Elevated source/drain by sacrificial selective epitaxy for high performance deep submicron CMOS: Process window versus complexity

2000 ◽  
Vol 47 (7) ◽  
pp. 1484-1491 ◽  
Author(s):  
E. Augendre ◽  
R. Rooyackers ◽  
M. Caymax ◽  
E.P. Vandamme ◽  
A. De Keersgieter ◽  
...  
2000 ◽  
Vol 47 (4) ◽  
pp. 848-855 ◽  
Author(s):  
Y.V. Ponomarev ◽  
P.A. Stolk ◽  
C. Salm ◽  
J. Schmitz ◽  
P.H. Woerlee

1996 ◽  
Vol 79 (11) ◽  
pp. 1-9 ◽  
Author(s):  
Manabu Deura ◽  
Yasuo Nara ◽  
Tatsuya Yamazaki ◽  
Kenichi Gotoh ◽  
Fumio Ohtake ◽  
...  

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