Electrical trimming of ion-beam-sputtered polysilicon resistors by high current pulses

1994 ◽  
Vol 41 (8) ◽  
pp. 1429-1434 ◽  
Author(s):  
S. Das ◽  
S.K. Lahiri
Keyword(s):  
Ion Beam ◽  
High Current ◽  
Current Pulses

Compact magnetic quadrupole triplet for a low-energy high-current ion beam transport

2008 ◽  
Vol 79 (2) ◽  
pp. 02B715
Author(s):  
Yong-Sub Cho ◽  
Han-Sung Kim ◽  
Hyeok-Jung Kwon
Keyword(s):  
Ion Beam ◽  
Low Energy ◽  
High Current ◽  
Beam Transport ◽  
Magnetic Quadrupole

scholarly journals The high current experiment: First results

2002 ◽  
Vol 20 (3) ◽  
pp. 435-440 ◽  
Author(s):  
P.A. SEIDL ◽  
D. BACA ◽  
F.M. BIENIOSEK ◽  
A. FALTENS ◽  
S.M. LUND ◽  
...  
Keyword(s):  
Space Charge ◽  
Ion Beam ◽  
Beam Steering ◽  
Fusion Energy ◽  
National Laboratory ◽  
Heavy Ion ◽  
High Current ◽  
Current Experiment ◽  
First Results ◽  
High Space

The High Current Experiment (HCX) is being assembled at Lawrence Berkeley National Laboratory as part of the U.S. program to explore heavy ion beam transport at a scale representative of the low-energy end of an induction linac driver for fusion energy production. The primary mission of this experiment is to investigate aperture fill factors acceptable for the transport of space-charge dominated heavy ion beams at high space-charge intensity (line-charge density ∼ 0.2 μC/m) over long pulse durations (>4 μs). This machine will test transport issues at a driver-relevant scale resulting from nonlinear space-charge effects and collective modes, beam centroid alignment and beam steering, matching, image charges, halo, lost-particle induced electron effects, and longitudinal bunch control. We present the first experimental results carried out with the coasting K+ ion beam transported through the first 10 electrostatic transport quadrupoles and associated diagnostics. Later phases of the experiment will include more electrostatic lattice periods to allow more sensitive tests of emittance growth, and also magnetic quadrupoles to explore similar issues in magnetic channels with a full driver scale beam.

Charge dissipation and self focusing limit in high current density ion beam transport through a micro glass capillary

2018 ◽  
Vol 52 (5) ◽  
pp. 055205 ◽  
Author(s):  
Sanjeev Kumar Maurya ◽  
Sushanta Barman ◽  
Samit Paul ◽  
Sudeep Bhattacharjee
Keyword(s):  
Current Density ◽  
High Current Density ◽  
Ion Beam ◽  
High Current ◽  
Beam Transport ◽  
Glass Capillary ◽  
Self Focusing

In-Situ Control of Wafer Charge Neutralization During High Current Ion Implants

1993 ◽  
Vol 316 ◽  
Author(s):  
E.N. Shauly ◽  
E. Koltin ◽  
I. Munin ◽  
Y. Avrahamov
Keyword(s):  
Real Time ◽  
Ion Beam ◽  
High Yield ◽  
Wafer Surface ◽  
High Current ◽  
Charge Condition ◽  
Major Process ◽  
Process Issue ◽  
Current Monitoring

ABSTRACTIon implantation in semiconductor devices frequently leads to a substantial wafer surface charge build up. Control of this charge during high current implantation is a major process issue, as it may affect the yield and reliability of thin dielectric layers. In addition, the charge build up may affect the ion beam resulting in a non-uniform implant and a reduction in device yield. Control of a specific machine parameter, that will give the charge condition of the ion implanter will enable to neutralize the charge build up.In this study, Disk Current Monitoring (DCM) is shown to be a reliable method for monitoring the Electron Shower (ES) performance in real time. A correlation was found between DCM level and yields, and between DCM level and breakdown voltage, as well as different maintenance activities regarding me ES. A simple 5 steps method is described to achieve a reliable, real time charge monitor, to insure operation within the “High Yield Range”.

Pulsed high current ion beam processing equipment

1997 ◽  
Vol 90 (1-2) ◽  
pp. 21-28 ◽  
Author(s):  
Sergey A. Korenev ◽  
Anthony J. Perry
Keyword(s):  
Ion Beam ◽  
High Current ◽  
Processing Equipment

scholarly journals 14C AMS Measurements of <100 μG Samples with a High-Current System

Radiocarbon ◽  
1997 ◽  
Vol 40 (1) ◽  
pp. 247-253 ◽  
Author(s):  
Karl F. Von Reden ◽  
Ann P. McNichol ◽  
Ann Pearson ◽  
Robert J. Schneider
Keyword(s):  
Current System ◽  
Ion Beam ◽  
Beam Current ◽  
Small Sample ◽  
Small Samples ◽  
High Current ◽  
Beam Optics ◽  
Woods Hole Oceanographic Institution ◽  
Factors Affecting ◽  
The Past

The NOSAMS facility at Woods Hole Oceanographic Institution has started to develop and apply techniques for measuring very small samples on a standard Tandetron accelerator mass spectrometry (AMS) system with high-current hemispherical Cs sputter ion sources. Over the past year, results on samples ranging from 7 to 160 μg C showed both the feasibility of such analyses and the present limitations on reducing the size of solid carbon samples. One of the main factors affecting the AMS results is the dependence of a number of the beam optics parameters on the extracted ion beam current. The extracted currents range from 0.5 to 10 μA of 12C− for the sample sizes given above. We here discuss the setup of the AMS system and methods for reliable small-sample measurements and give the AMS-related limits to sample size and the measurement uncertainties.

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