A study of residual stress distribution through the thickness of p/sup +/ silicon films (thermal oxidation effects)
1993 ◽
Vol 40
(7)
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pp. 1245-1250
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Keyword(s):
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2007 ◽
Vol 345-346
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pp. 1469-1472
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2021 ◽
Vol 284
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pp. 122856