Modeling hot-electron gate current in Si MOSFET's using a coupled drift-diffusion and Monte Carlo method

1992 ◽  
Vol 39 (11) ◽  
pp. 2562-2568 ◽  
Author(s):  
Chimoon Huang ◽  
Tahui Wang ◽  
C.N. Chen ◽  
M.C. Chang ◽  
J. Fu
1988 ◽  
Vol 49 (C4) ◽  
pp. C4-791-C4-794
Author(s):  
J. VOVES ◽  
J. VESELY

VLSI Design ◽  
1998 ◽  
Vol 8 (1-4) ◽  
pp. 343-347 ◽  
Author(s):  
Jürgen Jakumeit ◽  
Amanda Duncan ◽  
Umberto Ravaioli ◽  
Karl Hess

The Mutation Operator Monte Carlo method (MOMC) is a new type of Monte Carlo technique for the study of hot electron related effects in semiconductor devices. The MOMC calculates energy distributions of electrons by a physical mutation of the distribution towards a stationary condition. In this work we compare results of an one dimensional simulation of an 800nm Si-MOSFET with full band Monte Carlo calculations and measurement results. Starting from the potential distribution resulting from a drift diffusion simulation, the MOMC calculates electron distributions which are comparable to FBMC-results within minutes on a modern workstation. From these distributions, substrate and gate currents close to experimental results can be calculated. These results show that the MOMC is useful as a post-processor for the investigation of hot electron related problems in Si-MOSFETs. Beside the computational efficiency, a further advantage of the MOMC compared to standard MC techniques is the good resolution of the high energy tail of the distribution without the necessity of any statistical enhancement.


1986 ◽  
Author(s):  
B. Ricco ◽  
E. Sangiorgi ◽  
F. Venturi ◽  
P. Lugli

1998 ◽  
Vol 84 (9) ◽  
pp. 4673-4676 ◽  
Author(s):  
A. D. Güçlü ◽  
R. Maciejko ◽  
A. Champagne ◽  
M. Abou-Khalil ◽  
T. Makino

1989 ◽  
Vol 32 (12) ◽  
pp. 1347-1351 ◽  
Author(s):  
D.L. Woolard ◽  
J-L. Pelouard ◽  
R.J. Trew ◽  
M.A. Littlejohn ◽  
C.T. Kelley

1989 ◽  
Vol 36 (5) ◽  
pp. 930-937 ◽  
Author(s):  
J.M. Higman ◽  
K. Hess ◽  
C.G. Hwang ◽  
R.W. Dutton

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