The effect of PECVD SiNxmoisture barrier layers on the degradation of a flip chip underfill material

2001 ◽  
Vol 13 (3) ◽  
pp. 12-15 ◽  
Author(s):  
G. Kaltenpoth ◽  
W. Siebert ◽  
X‐M. Xie ◽  
F. Stubhan
Keyword(s):  
Flip Chip ◽  
Barrier Layers ◽  
Underfill Material

Effect of preformed IMC Layer on Electromigration of Solder Capped Cu Pillar Bump Interconnection on an organic substrate

2012 ◽  
Vol 2012 (1) ◽  
pp. 000455-000463 ◽  
Author(s):  
Yasumitsu Orii ◽  
Kazushige Toriyama ◽  
Sayuri Kohara ◽  
Hirokazu Noma ◽  
Keishi Okamoto ◽  
...  
Keyword(s):  
Flip Chip ◽  
Organic Substrate ◽  
Stress Tests ◽  
Cross Sectional ◽  
Current Stress ◽  
Barrier Layers ◽  
Cu Pillar ◽  
Fine Pitch ◽  
Cu Pillar Bump ◽  
Cu Dissolution

The electromigration behavior of 80 μm pitch solder capped Cu pillar bump interconnection on an organic carrier is studied and discussed. Recently the solder capped Cu pillar bump technology has been widely used in mobile applications as a peripheral ultra fine pitch flip chip interconnection technique. The solder capped Cu pillar bumps are formed on Al pads which are commonly used in wirebonding technique. It allows us an easy control of the space between the die and the substrate simply by varying the Cu pillar height. Since the control of the collapse of the solder bumps is not necessary, the technology is called the “C2 (Chip Connection)”. Solder capped Cu pillar bumps are connected to OSP surface treated Cu substrate pads on an organic substrate by reflow with a no-clean process, hence the C2 is a low cost ultra fine pitch flip chip interconnection technology. It is an ideal technology for the systems requiring fine pitch structures. In 2011, the EM tests were performed on 80 μm pitch solder capped Cu pillar bump interconnections and the effects of Ni barrier layers on the Cu pillars and the preformed intermetallic compound (IMC) layers on the EM tests were studied. The EM test conditions of the test vehicles were 7–10 kA/cm2 at 125–170°C. The Cu pillar height was 45 μm and the solder height was 25 μm. The solder composition was Sn-2.5Ag. Aged condition for pre-formed IMCs was 2,000 hours at 150°C. It was shown that the formation of the pre-formed IMC layers and the insertion of Ni barrier layers are effective in reducing the Cu atoms dissolution. In this report, it is studied that which of the IMC layers, Cu3Sn or Cu6Sn5, is more effective in preventing the Cu atom dissolution. The cross-sectional analyses of the joints after the 2000 hours of the test with 7kA/cm2 at 170°C were performed for this purpose. The relationship between the thickness of Cu3Sn IMC layer and the Cu migration is also studied by performing the current stress tests on the joints with controlled Cu3Sn IMC thicknesses. The samples were thermally aged prior to the tests at a higher temperature (200°C) and in a shorter time (10–50 hours) than the previous experiments. The cross-sectional analyses of the Sn-2.5Ag joints without pre-aging consisting mostly of Cu6Sn5, showed a significant Cu dissolution while the Cu dissolution was not detected for the pre-aged joints with thick Cu3Sn layers. A large number of Kirkendall voids were also observed in the joints without pre-aging. The current stress tests on the controlled Cu3Sn joints showed that Cu3Sn layer thickness of more than 1.5 μm is effective in reducing Cu dissolution in the joints.

Underfill Assessments and Validations for Low-k FCBGA

2006 ◽  
Author(s):  
Nicholas Kao ◽  
Jeng Yuan Lai ◽  
Jase Jiang ◽  
Yu Po Wang ◽  
C. S. Hsiao
Keyword(s):  
Finite Element ◽  
High Speed ◽  
Flip Chip ◽  
Failure Modes ◽  
Solder Bump ◽  
Material Selection ◽  
Coefficient Of Thermal Expansion ◽  
Electrical Performance ◽  
Low K ◽  
Underfill Material

With the trend of electronic consumer product toward more functionality, high performance and miniaturization, IC chip is required to deliver more I/Os signals and better electrical characteristics under same package form factor. Thus, Flip Chip BGA (FCBGA) package was developed to meet those requirements offering better electrical performance, more I/O pins accommodation and high transmission speed. For high-speed application, the low dielectric constant (low-k) material that can effectively reduce the signal delays is extensively used in IC chips. However, the low-k material possesses fragile mechanical property and high coefficient of thermal expansion (CTE) compared with silicon chip, which raises the reliability concerns of low-k material integrated into IC chip. The typical reliability failure modes are low-k layer delamination and bump crack under temperature loading during assembly and reliability test. Delamination is occurred in the interface between low-k dielectric layers and underfill material at chip corner. Bump crack is at Under Bump Metallization (UBM) corner. Thus, the adequate underfill material selection becomes very important for both solder bump and low-k chips [1]. This paper mainly characterized FCBGA underfill materials to guide the adequate candidates to prevent failures on low-k chip and solder bump. Firstly, test vehicle was a FCBGA package with heat spreader and was investigated the thermal stress by finite element models. In order to analyze localized low-k structures, sub-modeling technique is used for underfill characterizations. Then, the proper underfill candidates picked from modeling results were experimentally validated by reliability tests. Finally, various low-k FCBGA package structures were also studied with same finite element technique.

Flip Chip Underfill RF Characterization

2019 ◽  
Vol 2019 (1) ◽  
pp. 000243-000247
Author(s):  
Robert B. Paul ◽  
A. Ege Engin ◽  
Jerry Aguirre
Keyword(s):  
Integrated Circuits ◽  
Integrated Circuit ◽  
High Speed ◽  
Flip Chip ◽  
Power Integrity ◽  
Cavity Resonators ◽  
Dielectric Characterization ◽  
Noise Coupling ◽  
Solder Bumps ◽  
Underfill Material

Abstract To develop reliable high-speed packages, characterization of the underfill material used in the flip-chip process has become of greater importance. The underfill, typically an epoxy resin-based material, offers thermal and structural benefits for the integrated circuit (IC) on package. With so many inputs and outputs (IOs) in close proximity to one another, the integrated circuits on package can have unexpected signal and power integrity issues. Furthermore, chip packages can support signals only up to the frequency where noise coupling (e.g., crosstalk, switching noise, etc.) leads to the malfunctioning of the system. Vertical interconnects, such as vias and solder bumps, are major sources of noise coupling. Inserting ground references between every signal net is not practical. For the solder bumps, the noise coupling depends on the permittivity of the underfill material. Therefore, characterizing the permittivity of the underfill material helps in predicting signal and power integrity issues. Such liquid or semi-viscous materials are commonly characterized from a simple fringe capacitance model of an open-ended coaxial probe immersed in the material. The open-ended coaxial method, however, is not as accurate as resonator-based methods. There is a need for a methodology to accurately extract the permittivity of liquid or semi-viscous materials at high frequencies. The proposed method uses solid walled cavity resonators, where the resonator is filled with the underfill material and cured. Dielectric characterization is a complex process, where the physical characteristics of the cavities must be known or accurately measured. This includes the conductivity of the conductors, roughness of the conductors, the dimensions of the cavity, and the port pin locations. This paper discusses some of the challenges that are encountered when characterizing dielectrics with cavity resonators. This characterization methodology can also be used to characterize other materials of interest.

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