Development/Study of Thin Films for Electroluminescent Flat Panel Display

1992 ◽  
Vol 9 (1) ◽  
pp. 28-32 ◽  
Author(s):  
P.V. Natarajan ◽  
D.G. Vaiude ◽  
B.M. Rao
2002 ◽  
Vol 49 (1) ◽  
pp. 221-229 ◽  
Author(s):  
W. Zhu ◽  
O. K. Tan ◽  
J. Ray ◽  
Md A. Imam ◽  
X. F. Chen

2009 ◽  
Vol 517 (14) ◽  
pp. 4061-4064 ◽  
Author(s):  
Se Il Kim ◽  
Sang Hyun Cho ◽  
Sung Ryong Choi ◽  
Min Cheol Oh ◽  
Ji Hyang Jang ◽  
...  

Author(s):  
Reo Usui ◽  
Ryohei Satoh ◽  
Yoshiharu Iwata ◽  
Koji Nakagawa ◽  
Eiji Morinaga ◽  
...  

2001 ◽  
Vol 667 ◽  
Author(s):  
Richard Wood ◽  
Peter Hofstra ◽  
David Johnson

ABSTRACTLow temperature fabrication of transparent conducting materials is a key issue in flat panel display production. Though Cr-SiO cermet thin films have predominantly been used as thin film resistors in a variety of microelectronics applications, it is shown in this paper that the material can successfully be used as a transparent to semi-transparent conductor in some applications if the value of the extinction coefficient, k, can be kept low (<0.3). Thus, a detailed study of the interdependence of the resistivity and optical properties of Cr-SiO is presented for the first time within the context of its use in the flat panel display industry. Specifically, Cr-SiO can be employed as part of Luxell's optical interference structure, known as the Black Layer™, US patent 5,049,780, used to increase contrast in TFEL and OLED displays.


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