scholarly journals Dielectric laser acceleration of nonrelativistic electrons at a single fused silica grating structure: Experimental part

2014 ◽  
Vol 17 (2) ◽  
Author(s):  
John Breuer ◽  
Roswitha Graf ◽  
Alexander Apolonski ◽  
Peter Hommelhoff
Keyword(s):  
Fused Silica ◽  
Grating Structure ◽  
Experimental Part ◽  
Laser Acceleration

Design, fabrication, and testing of a fused-silica dual-layer grating structure for direct laser acceleration of electrons

2013 ◽  
Author(s):  
E. A. Peralta ◽  
E. Colby ◽  
R. J. England ◽  
C. McGuinness ◽  
B. Montazeri ◽  
...  
Keyword(s):  
Fused Silica ◽  
Grating Structure ◽  
Direct Laser ◽  
Laser Acceleration

scholarly journals Generation of three-port splitter by double-layer grating in second-order Littrow configuration

2020 ◽  
Vol 50 (2) ◽  
Author(s):  
Chenhao Gao ◽  
Bo Wang ◽  
Chen Fu ◽  
Jimin Fang_ ◽  
Kunhua Wen ◽  
...  
Keyword(s):  
Double Layer ◽  
Beam Splitter ◽  
High Efficiency ◽  
Single Layer ◽  
Fused Silica ◽  
Second Order ◽  
Grating Structure ◽  
Grating Region ◽  
Fabrication Tolerance ◽  
Littrow Configuration

In this paper, a novel double-layer three-port grating is described. The incident grating structure is in the second-order Littrow configuration. The grating region is composed of fused silica and Ta2O5. The designed grating beam splitter has high efficiency under TE polarization and TM polarization, respectively. The efficiency of two polarizations is more than 90%. In addition, compared with a single-layer three-port grating, this new beam splitter has good fabrication tolerance and incident bandwidth. Therefore, the optimized structure has a good application value.

Resonant enhancement of accelerating gradient with silicon dual-grating structure for dielectric laser acceleration of subrelativistic electrons

2018 ◽  
Vol 112 (3) ◽  
pp. 034102 ◽  
Author(s):  
Zhaofu Chen ◽  
Kazuyoshi Koyama ◽  
Mitsuru Uesaka ◽  
Mitsuhiro Yoshida ◽  
Rui Zhang
Keyword(s):  
Resonant Enhancement ◽  
Grating Structure ◽  
Laser Acceleration

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

Investigation of fused silica dynamic behaviour

2006 ◽  
Vol 134 ◽  
pp. 929-934 ◽  
Author(s):  
F. Malaise ◽  
J.-M. Chevalier ◽  
I. Bertron ◽  
F. Malka
Keyword(s):  
Dynamic Behaviour ◽  
Fused Silica
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