Ion explosion and multi-mega-electron-volt ion generation from an underdense plasma layer irradiated by a relativistically intense short-pulse laser

1999 ◽  
Vol 60 (5) ◽  
pp. 5987-5990 ◽  
Author(s):  
M. Yamagiwa ◽  
J. Koga ◽  
L. N. Tsintsadze ◽  
Y. Ueshima ◽  
Y. Kishimoto
Keyword(s):  
Pulse Laser ◽  
Plasma Layer ◽  
Short Pulse ◽  
Electron Volt ◽  
Short Pulse Laser ◽  
Ion Generation ◽  
Underdense Plasma

On the electromagnetic-electron rings originating from the interaction of high-power short-pulse laser and underdense plasma

2021 ◽  
Vol 28 (12) ◽  
pp. 122104
Author(s):  
P. Valenta ◽  
G. M. Grittani ◽  
C. M. Lazzarini ◽  
O. Klimo ◽  
S. V. Bulanov
Keyword(s):  
Pulse Laser ◽  
High Power ◽  
Short Pulse ◽  
Short Pulse Laser ◽  
Underdense Plasma

scholarly journals Electron acceleration by an intense short-pulse laser in underdense plasma

2003 ◽  
Vol 10 (6) ◽  
pp. 2468-2474 ◽  
Author(s):  
M. Y. Yu ◽  
Wei Yu ◽  
Z. Y. Chen ◽  
J. Zhang ◽  
Y. Yin ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Electron Acceleration ◽  
Short Pulse Laser ◽  
Underdense Plasma

Silicon Thinning using Ultra-Short Pulse Laser Ablation

2004 ◽  
Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Sample Preparation ◽  
Pulse Laser ◽  
Pulse Laser Ablation ◽  
Short Pulse ◽  
Special Care ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.

Chromium oxide dissolution in steels via short pulse laser processing

2013 ◽  
Vol 115 (4) ◽  
pp. 1469-1477 ◽  
Author(s):  
Evgeny Kharanzhevskiy ◽  
Sergey Reshetnikov
Keyword(s):  
Pulse Laser ◽  
Chromium Oxide ◽  
Laser Processing ◽  
Short Pulse ◽  
Oxide Dissolution ◽  
Short Pulse Laser
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