Computer simulation of self-assembling processes of a binary mixture containing a block copolymer

1994 ◽  
Vol 50 (4) ◽  
pp. 2856-2862 ◽  
Author(s):  
Toshihiro Kawakatsu
Keyword(s):  
Computer Simulation ◽  
Block Copolymer ◽  
Binary Mixture ◽  
Self Assembling

scholarly journals Rapid thermal processing of self-assembling block copolymer thin films

2013 ◽  
Vol 24 (31) ◽  
pp. 315601 ◽  
Author(s):  
F Ferrarese Lupi ◽  
T J Giammaria ◽  
M Ceresoli ◽  
G Seguini ◽  
K Sparnacci ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Self Assembling

A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block

2010 ◽  
Vol 256 (20) ◽  
pp. 5843-5848 ◽  
Author(s):  
Qi Wang ◽  
Jinghui Yang ◽  
Weiwei Yao ◽  
Ke Wang ◽  
Rongni Du ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Organic Silicon ◽  
Self Assembling ◽  
Simple Pathway

Novel Self-Assembling Amino Acid-Derived Block Copolymer with Changeable Polymer Backbone Structure

Langmuir ◽  
2016 ◽  
Vol 32 (47) ◽  
pp. 12378-12386 ◽  
Author(s):  
Tomoyuki Koga ◽  
Eri Aso ◽  
Nobuyuki Higashi
Keyword(s):  
Amino Acid ◽  
Block Copolymer ◽  
Polymer Backbone ◽  
Self Assembling ◽  
Backbone Structure

Self-assembling study of a cylinder-forming block copolymer via a nucleation–growth mechanism

2009 ◽  
Vol 20 (9) ◽  
pp. 095602 ◽  
Author(s):  
Karim Aissou ◽  
Martin Kogelschatz ◽  
Thierry Baron
Keyword(s):  
Block Copolymer ◽  
Growth Mechanism ◽  
Self Assembling ◽  
Nucleation Growth

scholarly journals Self-Assembling Block Copolymer Systems Involving Competing Length Scales:  A Route toward Responsive Materials

2004 ◽  
Vol 37 (11) ◽  
pp. 4296-4303 ◽  
Author(s):  
Rikkert Nap ◽  
Igor Erukhimovich ◽  
Gerrit ten Brinke
Keyword(s):  
Block Copolymer ◽  
Length Scales ◽  
Responsive Materials ◽  
Self Assembling

scholarly journals Titelbild: Precisely Tunable Photonic Crystals From Rapidly Self-Assembling Brush Block Copolymer Blends (Angew. Chem. 45/2012)

2012 ◽  
Vol 124 (45) ◽  
pp. 11335-11335
Author(s):  
Garret M. Miyake ◽  
Victoria A. Piunova ◽  
Raymond A. Weitekamp ◽  
Robert H. Grubbs
Keyword(s):  
Block Copolymer ◽  
Photonic Crystals ◽  
Copolymer Blends ◽  
Self Assembling

Precisely Tunable Photonic Crystals From Rapidly Self-Assembling Brush Block Copolymer Blends

2012 ◽  
Vol 124 (45) ◽  
pp. 11408-11410 ◽  
Author(s):  
Garret M. Miyake ◽  
Victoria A. Piunova ◽  
Raymond A. Weitekamp ◽  
Robert H. Grubbs
Keyword(s):  
Block Copolymer ◽  
Photonic Crystals ◽  
Copolymer Blends ◽  
Self Assembling

scholarly journals Bionic soft crystalline lens materials for MEMs applications based on self-assembling amphiphilic block copolymer/nanoparticle hybrids

2011 ◽  
Vol 88 (8) ◽  
pp. 1737-1741 ◽  
Author(s):  
Chun-Jie Chang ◽  
Yi-Lung Yang ◽  
Yu-Ping Lee ◽  
Chi-Ju Chiang ◽  
Chi-An Dai ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Crystalline Lens ◽  
Amphiphilic Block Copolymer ◽  
Self Assembling

scholarly journals Gelation properties of self-assembling N-acyl modified cytidine derivatives

2014 ◽  
Vol 2 (47) ◽  
pp. 8412-8417 ◽  
Author(s):  
K. J. Skilling ◽  
A. Ndungu ◽  
B. Kellam ◽  
M. Ashford ◽  
T. D. Bradshaw ◽  
...  
Keyword(s):  
Binary Mixture ◽  
Organic Solvent ◽  
Self Assembling ◽  
Delivery Platform

A new design for a self-assembling gelator of cytidine containing a binary mixture of organic solvent and water, shown to provide a suitable delivery platform for high and low Mw molecules.

Self-assembled PS-PMMA nanodot array pattern arranged in a parallelogram guide

2005 ◽  
Vol 901 ◽  
Author(s):  
Kaori Kimura ◽  
Masatoshi Sakurai
Keyword(s):  
Phase Separation ◽  
Block Copolymer ◽  
Film Thickness ◽  
Nanoimprint Lithography ◽  
Pmma Film ◽  
Patterned Media ◽  
Nanodot Array ◽  
Self Assembling ◽  
Array Pattern ◽  
Self Assembled

AbstractMask patterns for XY-type magnetic patterned media using phase separation of polystyrene-polymethylmethacrylate (PS-PMMA) block copolymer were fabricated. Parallelogram guides molded by the nanoimprint lithography controlled the PS-PMMA self-assembling pattern that formed in the guide area. 45nm-pitch defect-free PS-PMMA dot patterns were obtained within a 1μm × 1μm area by optimizing the PS-PMMA film thickness.

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