scholarly journals Angular-resolved photoemission electron spectroscopy and transport studies of the elemental topological insulator α -Sn

2018 ◽  
Vol 98 (19) ◽  
Author(s):  
Quentin Barbedienne ◽  
Julien Varignon ◽  
Nicolas Reyren ◽  
Alain Marty ◽  
Céline Vergnaud ◽  
...  
2019 ◽  
Author(s):  
Abhirami S. ◽  
Shilpam Sharma ◽  
E. P. Amaladass ◽  
Awadhesh Mani

2011 ◽  
Vol 18 (1) ◽  
pp. 36-57
Author(s):  
J. D. Lee ◽  
T Nagatomi ◽  
G Mizutani ◽  
K Endo

2004 ◽  
Vol 237 (1-4) ◽  
pp. 170-175 ◽  
Author(s):  
J. Labis ◽  
J. Oh ◽  
H. Namatame ◽  
M. Taniguchi ◽  
M. Hirai ◽  
...  

2009 ◽  
Vol 16 (2) ◽  
pp. 127-152 ◽  
Author(s):  
J. D. Lee ◽  
T. Nagatomi ◽  
G. Mizutani ◽  
K. Endo

2020 ◽  
Vol 63 (15-18) ◽  
pp. 1545-1556
Author(s):  
Bernhard von Boehn ◽  
Lena Scholtz ◽  
Ronald Imbihl

AbstractThe growth of ultrathin layers of VOx (< 12 monolayers) on Pt(111) and the activity of these layers in catalytic methanol oxidation at 10−4 mbar have been studied with low-energy electron diffraction, Auger electron spectroscopy, rate measurements, and with photoemission electron microscopy. Reactive deposition of V in O2 at 670 K obeys a Stranski–Krastanov growth mode with a (√3 × √3)R30° structure representing the limiting case for epitaxial growth of 3D-VOx. The activity of VOx/Pt(111) in catalytic methanol oxidation is very low and no redistribution dynamics is observed lifting the initial spatial homogeneity of the VOx layer. Under reaction conditions, part of the surface vanadium diffuses into the Pt subsurface region. Exposure to O2 causes part of the V to diffuse back to the surface, but only up to one monolayer of VOx can be stabilized in this way at 10−4 mbar.


1997 ◽  
Vol 377-379 ◽  
pp. 225-228 ◽  
Author(s):  
N. Marsot ◽  
R. Belkhou ◽  
F. Scheurer ◽  
B. Bartenlian ◽  
N. Barrett ◽  
...  

2021 ◽  
Vol 38 (11) ◽  
pp. 117302
Author(s):  
Fan Gao ◽  
Yongqing Li

In the transport studies of topological insulators, microflakes exfoliated from bulk single crystals are often used because of the convenience in sample preparation and the accessibility to high carrier mobilities. Here, based on finite element analysis, we show that for the non-Hall-bar shaped topological insulator samples, the measured four-point resistances can be substantially modified by the sample geometry, bulk and surface resistivities, and magnetic field. Geometry correction factors must be introduced for accurately converting the four-point resistances to the longitudinal resistivity and Hall resistivity. The magnetic field dependence of inhomogeneous current density distribution can lead to pronounced positive magnetoresistance and nonlinear Hall effect that would not exist in the samples of ideal Hall bar geometry.


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