Tailoring the electrical properties of Ge/GaAs by film deposition rate and preparation of fully compensated Ge films

2011 ◽  
Vol 84 (12) ◽  
Author(s):  
V. F. Mitin ◽  
V. K. Lazarov ◽  
P. M. Lytvyn ◽  
P. J. Hasnip ◽  
V. V. Kholevchuk ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Deposition Rate ◽  
Film Deposition ◽  
Film Deposition Rate

Variation of thin film deposition rate on SS 314 with the variation of gas flow rate using CVD

2011 ◽  
Vol 63 (6) ◽  
pp. 433-439 ◽  
Author(s):  
Mohammad Asaduzzaman Chowdhury ◽  
Dewan Muhammad Nuruzzaman ◽  
Khaled Khalil ◽  
Mohammad Lutfar Rahaman
Keyword(s):  
Thin Film ◽  
Deposition Rate ◽  
Flow Rate ◽  
Gas Flow ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Gas Flow Rate ◽  
Film Deposition Rate

FTIR absorption spectroscopy as a novel method for thin film deposition rate measurement

2013 ◽  
Vol 114 (4) ◽  
pp. 1295-1301
Author(s):  
Thomas Reichenbacher ◽  
Simon Schuetz ◽  
Ilja Stasewitsch ◽  
Stephan Fabig
Keyword(s):  
Thin Film ◽  
Deposition Rate ◽  
Absorption Spectroscopy ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Rate Measurement ◽  
Film Deposition Rate ◽  
Novel Method

scholarly journals Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.

Shinku ◽  
1991 ◽  
Vol 34 (4) ◽  
pp. 427-431
Author(s):  
Mitsuo. SHIMOZUMA ◽  
Jin. MURAKAMI ◽  
Gen. TOCHITANI ◽  
Takashi. TSUJI ◽  
Hiroaki. TAGASHIRA
Keyword(s):  
Silicon Nitride ◽  
Deposition Rate ◽  
Low Frequency ◽  
Film Deposition ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Plasma Cvd ◽  
Film Deposition Rate

Effect of Sodium Hypophosphite Content to the Deposition Rate, Structure and Magnetic Properties of Electroless Deposited Ni-P Alloy

2014 ◽  
Vol 215 ◽  
pp. 237-241 ◽  
Author(s):  
Roman N. Yaroslavtsev ◽  
Lydia A. Chekanova ◽  
Sergey V. Komogortsev ◽  
Rauf S. Iskhakov
Keyword(s):  
Magnetic Properties ◽  
Deposition Rate ◽  
Phosphorus Content ◽  
Resonance Field ◽  
Film Deposition ◽  
Sodium Hypophosphite ◽  
X Ray Diffraction ◽  
Deposition Kinetics ◽  
Film Deposition Rate ◽  
Deposited Films

The deposition kinetics, structure and magnetic properties of electroless deposited films Ni-P were investigated depending on the amount of sodium hypophosphite in the electroless bath. It was found that the film deposition rate is linear and unambiguously varies with the hypophosphite content from 2 to 13 g/l and from 23 to 25 g/l. The deposition rate varies widely in the hypophosphite concentration range from 13 to 23 g/l. The films are composed of amorphous Ni-P phase and fcc Ni-P solid solution with phosphorus content from 1 to 4 at.% P according to X-ray diffraction. The partial amount of amorphous phase is increased with concentration of sodium hypophosphite. The ferromagnetic resonance field is independent on the concentration of sodium hypophosphite, which assumes to be result from the laminated allocation of the amorphous and fcc phases in the film.

Sign in / Sign up

Export Citation Format

Share Document