Oxidized In-containing III-V(100) surfaces: Formation of crystalline oxide films and semiconductor-oxide interfaces

2011 ◽  
Vol 83 (19) ◽  
Author(s):  
M. P. J. Punkkinen ◽  
P. Laukkanen ◽  
J. Lång ◽  
M. Kuzmin ◽  
M. Tuominen ◽  
...  
Keyword(s):  
Oxide Films ◽  
Oxide Interfaces ◽  
Crystalline Oxide

Numerical Simulations on the Growth of Thin Oxide Films on Aluminum Substrates

2010 ◽  
Vol 297-301 ◽  
pp. 954-959 ◽  
Author(s):  
Aurelien Perron ◽  
Sébastien Garruchet ◽  
Olivier Politano ◽  
G. Aral ◽  
Vincent Vignal
Keyword(s):  
Chemical Composition ◽  
Oxygen Pressure ◽  
Oxide Films ◽  
Oxidation Kinetic ◽  
Degree Of Crystallinity ◽  
Crystalline Oxide ◽  
Thin Oxide Films ◽  
Nanocrystalline Aluminum ◽  
Aluminum Substrates ◽  
Aluminum Surfaces

We investigated the oxidation of nanocrystalline aluminum surfaces by using variable charge molecular dynamics at 600 K under three oxygen pressures: 1, 10 and 20 atm. The interaction potential was described by the electrostatic plus (Es+) model that allows dynamical charge transfer among atoms. We mainly focused on the effect of the oxygen pressure on the oxidation kinetic, the chemical composition and the microstructure of the oxide films formed. The results show that oxidation kinetics as well as chemical composition and microstructure depend on the applied oxygen pressure. The oxide film thickness tends to a limiting value equal to ~3 nm. Finally, we obtained a partially crystalline oxide films for all oxygen pressures and we observed that the degree of crystallinity increases with time.

Synthesis of Group 13 Sesquialkoxides and Their Application as Precursors to Crystalline Oxide Films

2007 ◽  
Vol 26 (2) ◽  
pp. 403-407 ◽  
Author(s):  
Siama Basharat ◽  
William Betchley ◽  
Claire J. Carmalt ◽  
Sarah Barnett ◽  
Derek A. Tocher ◽  
...  
Keyword(s):  
Oxide Films ◽  
Group 13 ◽  
Crystalline Oxide

scholarly journals Formation of Two-dimensional Electron Gas at Amorphous/Crystalline Oxide Interfaces

2018 ◽  
Vol 8 (1) ◽  
Author(s):  
ChengJian Li ◽  
YanPeng Hong ◽  
HongXia Xue ◽  
XinXin Wang ◽  
Yongchun Li ◽  
...  
Keyword(s):  
Electron Gas ◽  
Two Dimensional ◽  
Dimensional Electron ◽  
Two Dimensional Electron Gas ◽  
Oxide Interfaces ◽  
Crystalline Oxide ◽  
Dimensional Electron Gas

A Study of the Effects of Amorphous/Crystalline Oxide Films on the Cold Spray Behavior of 6061 Al Alloy Powders

2021 ◽  
Author(s):  
Arvand Navabi ◽  
Mobin Vandadi ◽  
Trevor Bond ◽  
Vahid Rahneshin ◽  
John Obayemi ◽  
...  
Keyword(s):  
Cold Spray ◽  
Oxide Films ◽  
Al Alloy ◽  
Crystalline Oxide ◽  
6061 Al Alloy

Resolving Crystallites in Zirconium Oxide Films

1969 ◽  
Vol 27 ◽  
pp. 140-141
Author(s):  
R.A. Ploc
Keyword(s):  
Electron Microscope ◽  
Inelastic Scattering ◽  
Zirconium Oxide ◽  
Oxide Films ◽  
Optic Axis ◽  
Objective Lens ◽  
Microscope Objective ◽  
Linear Optic ◽  
A Current ◽  
Microscope Objective Lens

The optic axis of an electron microscope objective lens is usually assumed to be straight and co-linear with the mechanical center. No reason exists to assume such perfection and, indeed, simple reasoning suggests that it is a complicated curve. A current centered objective lens with a non-linear optic axis when used in conjunction with other lenses, leads to serious image errors if the nature of the specimen is such as to produce intense inelastic scattering.

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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