scholarly journals Model of a switching oxide trap in amorphous silicon dioxide

2001 ◽  
Vol 64 (8) ◽  
Author(s):  
T. Uchino ◽  
M. Takahashi ◽  
T. Yoko
Author(s):  
И.П. Щербаков ◽  
А.Е. Чмель

AbstractThe introduction of Si^+ ions and ions of other elements into amorphous silicon dioxide during their interaction causes damage to the structural bonds, which is observed in the vibrational spectral bands. Pure SiO_2 has no optical transitions but the bands of induced point defects appear in the photoluminescence spectrum when ions/neutrons are introduced. The generation of photoluminescence-active defects by fluxes of Ar^+ ion and thermal neutrons is compared. It is shown that the nature of damage to the structure is associated with both the specifics of the synthesis/processing of the material and the features of the interaction between the substance and ions (atomic collisions) and neutrons (collisions with atomic nuclei).


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