Temperature-induced ion kinetic energy relaxation and yield ofH−dissociative electron attachment from hydrogenated diamond films

2001 ◽  
Vol 63 (24) ◽  
Author(s):  
A. Hoffman ◽  
S. Ustaze ◽  
M. Hadj Hamou ◽  
M. N. Hedhili ◽  
Y. Le Coat ◽  
...  
1971 ◽  
Vol 49 (9) ◽  
pp. 1571-1574 ◽  
Author(s):  
D. A. Rallis ◽  
J. M. Goodings

A trapped electron apparatus has been used to identify the processes involved in negative ion formation for the triatomic oxides SO2 and NO2. Two O− peaks are observed in SO2 with onset values at 4.2 ± 0.15 and 6.3 ± 0.2 eV, and peak values at 5.0 ± 0.15 and 7.4 ± 0.15 eV, respectively. From kinetic energy analysis of the O− ions, both peaks are found to have the same dissociation limit involving SO in its ground state. For NO2, two dissociative electron attachment peaks are observed with onset values at 1.6 ± 0.2 and 7.3 ± 0.3 eV, and peak values at 3.0 ± 0.2 and 8.1 ± 0.2 eV, respectively. The first broad peak is explained by overlapping contributions from two processes having the same dissociation limit involving ground state NO; they differ only in the amount of kinetic energy possessed by the fragments. The second peak appears to involve electronic excitation of the neutral fragment NO* with zero kinetic energy at onset.


1998 ◽  
Vol 73 (18) ◽  
pp. 2591-2593 ◽  
Author(s):  
Vladimir I. Merkulov ◽  
Douglas H. Lowndes ◽  
G. E. Jellison ◽  
A. A. Puretzky ◽  
D. B. Geohegan

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