Monte Carlo simulation of polycrystalline thin film deposition

2000 ◽  
Vol 63 (3) ◽  
Author(s):  
P. Bruschi ◽  
A. Nannini ◽  
F. Pieri
Keyword(s):  
Thin Film ◽  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Polycrystalline Thin Film

Monte Carlo Atomistic Simulation of Polycrystalline Aluminum Deposition

1998 ◽  
Vol 514 ◽  
Author(s):  
J. Emiliano Rubio ◽  
Martín Jaraíz ◽  
Luis A. BaiIón ◽  
Juan Barbolla ◽  
M José López ◽  
...  
Keyword(s):  
Monte Carlo ◽  
Atomistic Simulation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Polycrystalline Thin Film ◽  
Columnar Growth ◽  
Polycrystalline Aluminum ◽  
Different Temperatures ◽  
Aluminum Deposition ◽  
Selection Of

ABSTRACTA new atomistic scheme for simulating polycrystalline thin film deposition based on a Monte Carlo approach has been developed. Simulations of polycrystalline aluminum deposition and annealing at different temperatures are presented. The time evolution of the film morphology for those temperatures is discussed. During deposition, columnar growth is observed at low temperatures. Grain growth takes place mainly during annealing. Faceting and selection of preferred crystal orientations (texture) is observed.

Reentrant Growth in Kinetic Thin-Film Deposition on Stepped Surfaces

1995 ◽  
Vol 399 ◽  
Author(s):  
Rong-Fu Xiao
Keyword(s):  
Thin Film ◽  
Monte Carlo Simulation ◽  
Deposition Temperature ◽  
Diffusion Length ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Natural Phenomenon ◽  
Two Dimensional ◽  
Stepped Surfaces ◽  
Thin Film Epitaxy

ABSTRACTWe have studied the reentrant growth in kinetic thin-film deposition on stepped surfaces using a Monte Carlo simulation. The results show that the reentrant oscillation of two dimensional nucleation growth occurs as a result of the variation of surface diffusion length with deposition temperature, and that it is a natural phenomenon in kinetic thin-film epitaxy on a substrate with a permanent step source.

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