scholarly journals Exciton localization and interface roughness in growth-interrupted GaAs/AlAs quantum wells

2000 ◽  
Vol 61 (15) ◽  
pp. 10322-10329 ◽  
Author(s):  
K. Leosson ◽  
J. R. Jensen ◽  
W. Langbein ◽  
J. M. Hvam
Keyword(s):  
Quantum Wells ◽  
Interface Roughness ◽  
Exciton Localization

Exciton localization, photoluminescence spectra, and interface roughness in thin quantum wells

1996 ◽  
Vol 54 (4) ◽  
pp. 2733-2738 ◽  
Author(s):  
U. Jahn ◽  
S. H. Kwok ◽  
M. Ramsteiner ◽  
R. Hey ◽  
H. T. Grahn ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Interface Roughness ◽  
Photoluminescence Spectra ◽  
Exciton Localization

Microroughness and exciton localization in (Al,Ga)As/GaAs quantum wells

1997 ◽  
Vol 55 (8) ◽  
pp. 5253-5258 ◽  
Author(s):  
R. Grousson ◽  
V. Voliotis ◽  
N. Grandjean ◽  
J. Massies ◽  
M. Leroux ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Exciton Localization

Exciton localization inInxGa1−xAs/GaAs quantum wells observed by temperature-modulated photoluminescence

1991 ◽  
Vol 43 (2) ◽  
pp. 1546-1550 ◽  
Author(s):  
M. Gal ◽  
Z. Y. Xu ◽  
F. Green ◽  
B. F. Usher
Keyword(s):  
Quantum Wells ◽  
Exciton Localization

Optical Study of Localized and Delocalized States in GaAsN/GaAs

2003 ◽  
Vol 798 ◽  
Author(s):  
Z. Y. Xu ◽  
X. D. Luo ◽  
X. D. Yang ◽  
P. H. Tan ◽  
C. L. Yang ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Rapid Thermal Annealing ◽  
Short Pulse ◽  
Selective Excitation ◽  
Excitation Power ◽  
Pulse Excitation ◽  
Optical Study ◽  
Time Resolved ◽  
Exciton Localization ◽  
Time Resolved Photoluminescence

ABSTRACTTaking advantages of short pulse excitation and time-resolved photoluminescence (PL), we have studied the exciton localization effect in a number of GaAsN alloys and GaAsN/GaAs quantum wells (QWs). In the PL spectra, an extra transition located at the higher energy side of the commonly reported N-related emissions is observed. By measuring PL dependence on temperature and excitation power along with PL dynamics study, the new PL peak has been identified as a transition of the band edge-related recombination in dilute GaAsN alloy and delocalized transition in QWs. Using selective excitation PL we further attribute the localized emission in QWs to the excitons localized at the GaAsN/GaAs interfaces. This interface-related exciton localization could be greatly reduced by a rapid thermal annealing.

Exciton localization in group-III nitride quantum wells

1999 ◽  
Vol 59 (15) ◽  
pp. 9783-9786 ◽  
Author(s):  
V. I. Litvinov ◽  
M. Razeghi
Keyword(s):  
Quantum Wells ◽  
Group Iii ◽  
Exciton Localization ◽  
Group Iii Nitride

Evidence of Interface Roughness Correlation in CdTe/(Cd, Zn)Te Quantum Wells

1996 ◽  
pp. 275-277
Author(s):  
E. J. Mayer ◽  
N. T. Pelekanos ◽  
J. Kuhl ◽  
N. Magnea ◽  
H. Mariette
Keyword(s):  
Quantum Wells ◽  
Interface Roughness

Reduction of trap concentration and interface roughness of GaAs/AlGaAs quantum wells by low growth rates in molecular beam epitaxy

1989 ◽  
Vol 55 (1) ◽  
pp. 50-52 ◽  
Author(s):  
Ch. Maierhofer ◽  
S. Munnix ◽  
D. Bimberg ◽  
R. K. Bauer ◽  
D. E. Mars ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Quantum Wells ◽  
Growth Rates ◽  
Molecular Beam ◽  
Interface Roughness ◽  
Trap Concentration
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