Exciton localization, photoluminescence spectra, and interface roughness in thin quantum wells

1996 ◽  
Vol 54 (4) ◽  
pp. 2733-2738 ◽  
Author(s):  
U. Jahn ◽  
S. H. Kwok ◽  
M. Ramsteiner ◽  
R. Hey ◽  
H. T. Grahn ◽  
...  
2000 ◽  
Vol 61 (15) ◽  
pp. 10322-10329 ◽  
Author(s):  
K. Leosson ◽  
J. R. Jensen ◽  
W. Langbein ◽  
J. M. Hvam

1992 ◽  
Vol 280 ◽  
Author(s):  
M.J.S.P. Brasil ◽  
R. E. Nahory ◽  
M. C. Tamargo ◽  
S. Schwarz

ABSTRACTWe have investigated the interface roughness of single thin InP/InAs quantum wells grown by Chemical Beam Epitaxy. We report results of low temperature photoluminescence and secondary ion mass spectroscopy. The interface roughness is characterized by multiple-line photoluminescence spectra and is very sensitive to parameters such as the growth temperature. Details of the interface roughness are discussed based on the shifts of the excitonic energies observed by photoluminescence.


1997 ◽  
Vol 55 (8) ◽  
pp. 5253-5258 ◽  
Author(s):  
R. Grousson ◽  
V. Voliotis ◽  
N. Grandjean ◽  
J. Massies ◽  
M. Leroux ◽  
...  

1991 ◽  
Vol 43 (2) ◽  
pp. 1546-1550 ◽  
Author(s):  
M. Gal ◽  
Z. Y. Xu ◽  
F. Green ◽  
B. F. Usher

2003 ◽  
Vol 798 ◽  
Author(s):  
Z. Y. Xu ◽  
X. D. Luo ◽  
X. D. Yang ◽  
P. H. Tan ◽  
C. L. Yang ◽  
...  

ABSTRACTTaking advantages of short pulse excitation and time-resolved photoluminescence (PL), we have studied the exciton localization effect in a number of GaAsN alloys and GaAsN/GaAs quantum wells (QWs). In the PL spectra, an extra transition located at the higher energy side of the commonly reported N-related emissions is observed. By measuring PL dependence on temperature and excitation power along with PL dynamics study, the new PL peak has been identified as a transition of the band edge-related recombination in dilute GaAsN alloy and delocalized transition in QWs. Using selective excitation PL we further attribute the localized emission in QWs to the excitons localized at the GaAsN/GaAs interfaces. This interface-related exciton localization could be greatly reduced by a rapid thermal annealing.


1999 ◽  
Vol 59 (15) ◽  
pp. 9783-9786 ◽  
Author(s):  
V. I. Litvinov ◽  
M. Razeghi

Author(s):  
E. J. Mayer ◽  
N. T. Pelekanos ◽  
J. Kuhl ◽  
N. Magnea ◽  
H. Mariette

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